Nanoscale control of friction and chemistry on silicon surfaces

Andrew S. Baluch, Rajiv Basu, Nathan P. Guisinger, C. Reagan Kinser, Donald E. Kramer, Matthew W. Such, Mark C. Hersam

Research output: Contribution to journalConference article

Abstract

The nanoscale control of friction and chemistry on silicon surfaces was discussed. Three techniques were described that enable the chemical reactivity of silicon surfaces to be customized down to the single molecule limit using scanned probe microscopy (SPM). By encapsulating the tip-sample junction in a solvent with low water and oxygen solubility, anodic oxidation was suppressed, thus enabling direct molecular attachment to the silicon surface from the liquid phase.

Original languageEnglish
Pages (from-to)539-548
Number of pages10
JournalMaterials Research Society Symposium - Proceedings
Volume750
Publication statusPublished - Dec 1 2002
EventSurface Engineering 2002 Sythesis, Characterization and Applications - Boston, MA, United States
Duration: Dec 2 2002Dec 5 2002

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Baluch, A. S., Basu, R., Guisinger, N. P., Kinser, C. R., Kramer, D. E., Such, M. W., & Hersam, M. C. (2002). Nanoscale control of friction and chemistry on silicon surfaces. Materials Research Society Symposium - Proceedings, 750, 539-548.