Nanoscale control of friction and chemistry on silicon surfaces

Andrew S. Baluch, Rajiv Basu, Nathan P. Guisinger, C. Reagan Kinser, Donald E. Kramer, Matthew W. Such, Mark C Hersam

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The nanoscale control of friction and chemistry on silicon surfaces was discussed. Three techniques were described that enable the chemical reactivity of silicon surfaces to be customized down to the single molecule limit using scanned probe microscopy (SPM). By encapsulating the tip-sample junction in a solvent with low water and oxygen solubility, anodic oxidation was suppressed, thus enabling direct molecular attachment to the silicon surface from the liquid phase.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsA. Kumar, W.J. Meng, Y. Cheng, J.S. Zabinski, G.L. Doll, S. Veprek
Pages539-548
Number of pages10
Volume750
Publication statusPublished - 2002
EventSurface Engineering 2002 Sythesis, Characterization and Applications - Boston, MA, United States
Duration: Dec 2 2002Dec 5 2002

Other

OtherSurface Engineering 2002 Sythesis, Characterization and Applications
CountryUnited States
CityBoston, MA
Period12/2/0212/5/02

Fingerprint

Silicon
Friction
Chemical reactivity
Anodic oxidation
Microscopic examination
Solubility
Oxygen
Molecules
Water
Liquids

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Baluch, A. S., Basu, R., Guisinger, N. P., Kinser, C. R., Kramer, D. E., Such, M. W., & Hersam, M. C. (2002). Nanoscale control of friction and chemistry on silicon surfaces. In A. Kumar, W. J. Meng, Y. Cheng, J. S. Zabinski, G. L. Doll, & S. Veprek (Eds.), Materials Research Society Symposium - Proceedings (Vol. 750, pp. 539-548)

Nanoscale control of friction and chemistry on silicon surfaces. / Baluch, Andrew S.; Basu, Rajiv; Guisinger, Nathan P.; Kinser, C. Reagan; Kramer, Donald E.; Such, Matthew W.; Hersam, Mark C.

Materials Research Society Symposium - Proceedings. ed. / A. Kumar; W.J. Meng; Y. Cheng; J.S. Zabinski; G.L. Doll; S. Veprek. Vol. 750 2002. p. 539-548.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Baluch, AS, Basu, R, Guisinger, NP, Kinser, CR, Kramer, DE, Such, MW & Hersam, MC 2002, Nanoscale control of friction and chemistry on silicon surfaces. in A Kumar, WJ Meng, Y Cheng, JS Zabinski, GL Doll & S Veprek (eds), Materials Research Society Symposium - Proceedings. vol. 750, pp. 539-548, Surface Engineering 2002 Sythesis, Characterization and Applications, Boston, MA, United States, 12/2/02.
Baluch AS, Basu R, Guisinger NP, Kinser CR, Kramer DE, Such MW et al. Nanoscale control of friction and chemistry on silicon surfaces. In Kumar A, Meng WJ, Cheng Y, Zabinski JS, Doll GL, Veprek S, editors, Materials Research Society Symposium - Proceedings. Vol. 750. 2002. p. 539-548
Baluch, Andrew S. ; Basu, Rajiv ; Guisinger, Nathan P. ; Kinser, C. Reagan ; Kramer, Donald E. ; Such, Matthew W. ; Hersam, Mark C. / Nanoscale control of friction and chemistry on silicon surfaces. Materials Research Society Symposium - Proceedings. editor / A. Kumar ; W.J. Meng ; Y. Cheng ; J.S. Zabinski ; G.L. Doll ; S. Veprek. Vol. 750 2002. pp. 539-548
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