Abstract
We present fabrication schemes for nanoscale molecular junctions, which allow the deposition of molecules after the fabrication steps that can uncontrollably affect the electrical properties of the molecular layers. The two techniques described here use shadow mask evaporation and nanotransfer printing. In order to make reliable contacts with the molecules (or molecular monolayers) the morphology of the contacting metals has to be optimized and controlled. We therefore characterize the surfaces of the contacting metals using scanning electron microscopy and scanning probe microscopy at various stages of the fabrication. Based on these results we developed methods to improve the morphology in order to realize more reliable metal-molecule contacts. It is shown that improvement of the surface topography of the metals indeed leads to metal-molecule-metal junctions with a very low failure rate.
| Original language | English |
|---|---|
| Pages (from-to) | 3132-3137 |
| Number of pages | 6 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 23 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - Nov 2005 |
Fingerprint
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Surfaces and Interfaces
- Physics and Astronomy (miscellaneous)
Cite this
Nanoscale patterning in application to materials and device structures. / Erbe, A.; Jiang, W.; Bao, Z.; Abusch-Magder, D.; Tennant, D. M.; Garfunkel, Eric; Zhitenev, N.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 6, 11.2005, p. 3132-3137.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Nanoscale patterning in application to materials and device structures
AU - Erbe, A.
AU - Jiang, W.
AU - Bao, Z.
AU - Abusch-Magder, D.
AU - Tennant, D. M.
AU - Garfunkel, Eric
AU - Zhitenev, N.
PY - 2005/11
Y1 - 2005/11
N2 - We present fabrication schemes for nanoscale molecular junctions, which allow the deposition of molecules after the fabrication steps that can uncontrollably affect the electrical properties of the molecular layers. The two techniques described here use shadow mask evaporation and nanotransfer printing. In order to make reliable contacts with the molecules (or molecular monolayers) the morphology of the contacting metals has to be optimized and controlled. We therefore characterize the surfaces of the contacting metals using scanning electron microscopy and scanning probe microscopy at various stages of the fabrication. Based on these results we developed methods to improve the morphology in order to realize more reliable metal-molecule contacts. It is shown that improvement of the surface topography of the metals indeed leads to metal-molecule-metal junctions with a very low failure rate.
AB - We present fabrication schemes for nanoscale molecular junctions, which allow the deposition of molecules after the fabrication steps that can uncontrollably affect the electrical properties of the molecular layers. The two techniques described here use shadow mask evaporation and nanotransfer printing. In order to make reliable contacts with the molecules (or molecular monolayers) the morphology of the contacting metals has to be optimized and controlled. We therefore characterize the surfaces of the contacting metals using scanning electron microscopy and scanning probe microscopy at various stages of the fabrication. Based on these results we developed methods to improve the morphology in order to realize more reliable metal-molecule contacts. It is shown that improvement of the surface topography of the metals indeed leads to metal-molecule-metal junctions with a very low failure rate.
UR - http://www.scopus.com/inward/record.url?scp=29044448865&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=29044448865&partnerID=8YFLogxK
U2 - 10.1116/1.2130353
DO - 10.1116/1.2130353
M3 - Article
VL - 23
SP - 3132
EP - 3137
JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
SN - 1071-1023
IS - 6
ER -