Nanoscale patterning in application to materials and device structures

A. Erbe, W. Jiang, Z. Bao, D. Abusch-Magder, D. M. Tennant, Eric Garfunkel, N. Zhitenev

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We present fabrication schemes for nanoscale molecular junctions, which allow the deposition of molecules after the fabrication steps that can uncontrollably affect the electrical properties of the molecular layers. The two techniques described here use shadow mask evaporation and nanotransfer printing. In order to make reliable contacts with the molecules (or molecular monolayers) the morphology of the contacting metals has to be optimized and controlled. We therefore characterize the surfaces of the contacting metals using scanning electron microscopy and scanning probe microscopy at various stages of the fabrication. Based on these results we developed methods to improve the morphology in order to realize more reliable metal-molecule contacts. It is shown that improvement of the surface topography of the metals indeed leads to metal-molecule-metal junctions with a very low failure rate.

Original languageEnglish
Pages (from-to)3132-3137
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume23
Issue number6
DOIs
Publication statusPublished - Nov 2005

Fingerprint

Monolayers
Metals
metals
fabrication
Fabrication
Scanning probe microscopy
printing
Surface topography
topography
masks
electrical properties
evaporation
Printing
Masks
Evaporation
microscopy
Electric properties
scanning electron microscopy
scanning
probes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Nanoscale patterning in application to materials and device structures. / Erbe, A.; Jiang, W.; Bao, Z.; Abusch-Magder, D.; Tennant, D. M.; Garfunkel, Eric; Zhitenev, N.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 6, 11.2005, p. 3132-3137.

Research output: Contribution to journalArticle

Erbe, A. ; Jiang, W. ; Bao, Z. ; Abusch-Magder, D. ; Tennant, D. M. ; Garfunkel, Eric ; Zhitenev, N. / Nanoscale patterning in application to materials and device structures. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2005 ; Vol. 23, No. 6. pp. 3132-3137.
@article{4d081a7834284532bb5166831f073add,
title = "Nanoscale patterning in application to materials and device structures",
abstract = "We present fabrication schemes for nanoscale molecular junctions, which allow the deposition of molecules after the fabrication steps that can uncontrollably affect the electrical properties of the molecular layers. The two techniques described here use shadow mask evaporation and nanotransfer printing. In order to make reliable contacts with the molecules (or molecular monolayers) the morphology of the contacting metals has to be optimized and controlled. We therefore characterize the surfaces of the contacting metals using scanning electron microscopy and scanning probe microscopy at various stages of the fabrication. Based on these results we developed methods to improve the morphology in order to realize more reliable metal-molecule contacts. It is shown that improvement of the surface topography of the metals indeed leads to metal-molecule-metal junctions with a very low failure rate.",
author = "A. Erbe and W. Jiang and Z. Bao and D. Abusch-Magder and Tennant, {D. M.} and Eric Garfunkel and N. Zhitenev",
year = "2005",
month = "11",
doi = "10.1116/1.2130353",
language = "English",
volume = "23",
pages = "3132--3137",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "6",

}

TY - JOUR

T1 - Nanoscale patterning in application to materials and device structures

AU - Erbe, A.

AU - Jiang, W.

AU - Bao, Z.

AU - Abusch-Magder, D.

AU - Tennant, D. M.

AU - Garfunkel, Eric

AU - Zhitenev, N.

PY - 2005/11

Y1 - 2005/11

N2 - We present fabrication schemes for nanoscale molecular junctions, which allow the deposition of molecules after the fabrication steps that can uncontrollably affect the electrical properties of the molecular layers. The two techniques described here use shadow mask evaporation and nanotransfer printing. In order to make reliable contacts with the molecules (or molecular monolayers) the morphology of the contacting metals has to be optimized and controlled. We therefore characterize the surfaces of the contacting metals using scanning electron microscopy and scanning probe microscopy at various stages of the fabrication. Based on these results we developed methods to improve the morphology in order to realize more reliable metal-molecule contacts. It is shown that improvement of the surface topography of the metals indeed leads to metal-molecule-metal junctions with a very low failure rate.

AB - We present fabrication schemes for nanoscale molecular junctions, which allow the deposition of molecules after the fabrication steps that can uncontrollably affect the electrical properties of the molecular layers. The two techniques described here use shadow mask evaporation and nanotransfer printing. In order to make reliable contacts with the molecules (or molecular monolayers) the morphology of the contacting metals has to be optimized and controlled. We therefore characterize the surfaces of the contacting metals using scanning electron microscopy and scanning probe microscopy at various stages of the fabrication. Based on these results we developed methods to improve the morphology in order to realize more reliable metal-molecule contacts. It is shown that improvement of the surface topography of the metals indeed leads to metal-molecule-metal junctions with a very low failure rate.

UR - http://www.scopus.com/inward/record.url?scp=29044448865&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=29044448865&partnerID=8YFLogxK

U2 - 10.1116/1.2130353

DO - 10.1116/1.2130353

M3 - Article

VL - 23

SP - 3132

EP - 3137

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 6

ER -