The authors report on a comprehensive study of the neutralization of 75-180 kev He ions scattered from the UHV cleaned Si (100) surface using surface sensitive channeling techniques. It is shown that ions are neutralized exclusively at the solid surface on the ion's outward path. Angular and depth dependence results are discussed.
|Journal||Nuclear Inst. and Methods in Physics Research, B|
|Publication status||Published - Mar 1983|
ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Surfaces and Interfaces