New hybrid physical vapor deposition/organometallic chemical vapor deposition route to high Tc superconducting Tl-Ba-Ca-Cu-O thin films

D. S. Richeson, L. M. Tonge, X. K. Wang, H. O. Marcy, Tobin J Marks, J. B. Ketterson, Robert P. H. Chang, C. R. Kannewurf

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Abstract

High Tc superconducting Tl-Ba-Ca-Cu-O thin films have been prepared by a novel hybrid technique that combines electron beam evaporation with organometallic chemical vapor deposition (OMCVD). Multilayer thin films of Ba-Ca-Cu-O are prepared by sequential evaporation of BaF2, CaF 2, and Cu sources onto single-crystal MgO (100) or yttria-stabilized zirconia substrates followed by annealing in a water vapor-saturated oxygen atmosphere. Thallium is then incorporated in these films in either of two ways: (1) OMCVD using thallium(cyclopentadienide) as the source or (2) vapor diffusion using bulk Tl-Ba-Ca-Cu-O superconductor as the source. The resultant films are single phase, consisting predominantly of Tl1Ba2Ca 2Cu3Ox with crystallite Cu-O planes preferentially oriented parallel to the substrate surface. Resistivity measurements indicate superconducting onset temperatures above 120 K with zero resistance by 104 K. By eliminating the water vapor in the initial anneal, fluoride (originating from the Ba and Ca sources) may be retained in the film. Upon T1 incorporation, this promotes formation of the Tl1Ba 2Ca1Cu2Ox phase with preferential crystallite c-axis orientation perpendicular to the substrate surface.

Original languageEnglish
Pages (from-to)2778-2780
Number of pages3
JournalApplied Physics Letters
Volume55
Issue number26
DOIs
Publication statusPublished - 1989

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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