New low-melting cadmium precursors for the detailed study of texture effects in MOCVD derived CdO thin-films

Andrew W. Metz, John R. Ireland, Jun Ni, Kenneth R Poeppelmeier, Carl R. Kannewurf, Tobin J Marks

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

A new series of low-melting, highly volatile, thermally and air-stable cadmium MOCVD precursors have been synthesized and characterized. Cd(hfa)2(N,N-DE-N′,N′-DMEDA) has been successfully utilized in the growth of highly conductive and transparent CdO thin films. Hall measurements conducted on films deposited simultaneously on MgO (100) single crystal and Corning 1737F glass substrates reveal that the films on MgO have significantly enhanced carrier mobilities. Owing to similar grain sizes and carrier concentrations we attribute this effect to improved texture and associated improvements crystalline order. Conductivities as high as 8,590 S/cm are obtained which is to our knowledge the highest value reported to date for CdO films without aliovalent dopants.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsP.W. DeHaven, D.P. Field, S.D. Harkness IV, J.A. Sutliff, J.A. Szpunar, L Tang, T Thomson, M.D. Vaudin
Pages165-170
Number of pages6
Volume721
Publication statusPublished - 2002
EventMagnetic and Electronic Films - Microstructure, Texture and Application to Data Storage - San Francisco, United States
Duration: Apr 1 2002Apr 4 2002

Other

OtherMagnetic and Electronic Films - Microstructure, Texture and Application to Data Storage
CountryUnited States
CitySan Francisco
Period4/1/024/4/02

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Metz, A. W., Ireland, J. R., Ni, J., Poeppelmeier, K. R., Kannewurf, C. R., & Marks, T. J. (2002). New low-melting cadmium precursors for the detailed study of texture effects in MOCVD derived CdO thin-films. In P. W. DeHaven, D. P. Field, S. D. Harkness IV, J. A. Sutliff, J. A. Szpunar, L. Tang, T. Thomson, & M. D. Vaudin (Eds.), Materials Research Society Symposium - Proceedings (Vol. 721, pp. 165-170)