New precursors for barium metal-organic chemical vapor deposition. In situ growth of epitaxial barium titanate films using a liquid barium precursor

Deborah A. Neumayer, Daniel B. Studebaker, Bruce J. Hinds, Charlotte L. Stern, Tobin J Marks

Research output: Contribution to journalArticle

42 Citations (Scopus)
Original languageEnglish
Pages (from-to)878-880
Number of pages3
JournalChemistry of Materials
Volume6
Issue number7
Publication statusPublished - 1994

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

Cite this

New precursors for barium metal-organic chemical vapor deposition. In situ growth of epitaxial barium titanate films using a liquid barium precursor. / Neumayer, Deborah A.; Studebaker, Daniel B.; Hinds, Bruce J.; Stern, Charlotte L.; Marks, Tobin J.

In: Chemistry of Materials, Vol. 6, No. 7, 1994, p. 878-880.

Research output: Contribution to journalArticle

Neumayer, Deborah A. ; Studebaker, Daniel B. ; Hinds, Bruce J. ; Stern, Charlotte L. ; Marks, Tobin J. / New precursors for barium metal-organic chemical vapor deposition. In situ growth of epitaxial barium titanate films using a liquid barium precursor. In: Chemistry of Materials. 1994 ; Vol. 6, No. 7. pp. 878-880.
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