Nitrogen engineering of ultrathin oxynitrides by a thermal NO/O2/NO process

E. P. Gusev, H. C. Lu, Eric Garfunkel, T. Gustafsson, M. L. Green, D. Brasen, W. N. Lennard

Research output: Contribution to journalArticle

45 Citations (Scopus)

Abstract

The paper discusses nitrogen engineering of ultrathin (2/polysilicon interface to retard boron diffusion from the gate, and a smaller one peaked at the Si/SiO2 interface to increase the hot electron degradation resistance. We were able to produce this dielectric by a thermal (NO/O2/NO) process, aided by an understanding of the kinetics and thermodynamics of nitrogen incorporation in SiO2.

Original languageEnglish
Pages (from-to)2980-2982
Number of pages3
JournalJournal of Applied Physics
Volume84
Issue number5
Publication statusPublished - Sep 1 1998

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oxynitrides
engineering
nitrogen
hot electrons
boron
degradation
thermodynamics
kinetics

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Gusev, E. P., Lu, H. C., Garfunkel, E., Gustafsson, T., Green, M. L., Brasen, D., & Lennard, W. N. (1998). Nitrogen engineering of ultrathin oxynitrides by a thermal NO/O2/NO process. Journal of Applied Physics, 84(5), 2980-2982.

Nitrogen engineering of ultrathin oxynitrides by a thermal NO/O2/NO process. / Gusev, E. P.; Lu, H. C.; Garfunkel, Eric; Gustafsson, T.; Green, M. L.; Brasen, D.; Lennard, W. N.

In: Journal of Applied Physics, Vol. 84, No. 5, 01.09.1998, p. 2980-2982.

Research output: Contribution to journalArticle

Gusev, EP, Lu, HC, Garfunkel, E, Gustafsson, T, Green, ML, Brasen, D & Lennard, WN 1998, 'Nitrogen engineering of ultrathin oxynitrides by a thermal NO/O2/NO process', Journal of Applied Physics, vol. 84, no. 5, pp. 2980-2982.
Gusev EP, Lu HC, Garfunkel E, Gustafsson T, Green ML, Brasen D et al. Nitrogen engineering of ultrathin oxynitrides by a thermal NO/O2/NO process. Journal of Applied Physics. 1998 Sep 1;84(5):2980-2982.
Gusev, E. P. ; Lu, H. C. ; Garfunkel, Eric ; Gustafsson, T. ; Green, M. L. ; Brasen, D. ; Lennard, W. N. / Nitrogen engineering of ultrathin oxynitrides by a thermal NO/O2/NO process. In: Journal of Applied Physics. 1998 ; Vol. 84, No. 5. pp. 2980-2982.
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