Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

T. A. Roberts, D. H. Ko, K. E. Gray, Y. Y. Wang, Robert P. H. Chang, S. Ogawa

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The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi2. These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

Original languageEnglish
Pages (from-to)2054
Number of pages1
JournalApplied Physics Letters
Publication statusPublished - 1995


ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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