Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence

T. A. Roberts, D. H. Ko, K. E. Gray, Y. Y. Wang, Robert P. H. Chang, S. Ogawa

Research output: Contribution to journalArticle

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Abstract

The depth profile of a Co (300 Å)/Ti (50 Å) bilayer on Si(100) is studied by nondestructive refracted x-ray fluorescence before and after annealing. Following annealing, the angular distribution of the x-ray fluorescence indicates an inversion of the Co and Ti layers and the formation of CoSi2. These were confirmed by cross-section transmission electron microscopy and x-ray nanoprobe measurements. This success suggests that refracted x-ray fluorescence, which can be used as an in situ probe, may be ideally suited for analysis of thin-film reactions and interdiffusion.

Original languageEnglish
Pages (from-to)2054
Number of pages1
JournalApplied Physics Letters
Publication statusPublished - 1995

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x ray fluorescence
profiles
annealing
angular distribution
inversions
transmission electron microscopy
probes
cross sections
thin films
x rays

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence. / Roberts, T. A.; Ko, D. H.; Gray, K. E.; Wang, Y. Y.; Chang, Robert P. H.; Ogawa, S.

In: Applied Physics Letters, 1995, p. 2054.

Research output: Contribution to journalArticle

Roberts, T. A. ; Ko, D. H. ; Gray, K. E. ; Wang, Y. Y. ; Chang, Robert P. H. ; Ogawa, S. / Nondestructive depth profile measurement of a Co/Ti bilayer using refracted x-ray fluorescence. In: Applied Physics Letters. 1995 ; pp. 2054.
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