Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors

Hsing Hung Hsieh, Xinge Yu, Yu Xia, Chris W. Sheets, Chung Chin Hsiao, Tobin J Marks, And Antonio Facchetti

Research output: Chapter in Book/Report/Conference proceeding › Chapter

2 Citations (Scopus)

Abstract

Novel approaches including combustion synthesis achieved via both spin-coating/post annealing and spray-coating/in-situ annealing can be used to generate high-quality metal oxide thin films, including IGZO, and high performance metal oxide TFTs at relatively low temperatures. Furthermore, we demonstrate metal oxide TFTs using proprietary solution-processed dielectric and passivation layers.

Original languageEnglish
Title of host publicationDigest of Technical Papers - SID International Symposium
PublisherBlackwell Publishing Ltd
Pages427-430
Number of pages4
Volume45
Edition1
DOIs
Publication statusPublished - 2014

Fingerprint

Transistors
Oxides
Metals
Annealing
Combustion synthesis
Spin coating
Passivation
Temperature
Oxide films
Thin films
Coatings

Keywords

  • combustion synthesis
  • dielectric
  • IGZO
  • metal oxide TFT
  • solution process
  • spin coating with post annealing
  • spray coating with in-situ annealing

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Hsieh, H. H., Yu, X., Xia, Y., Sheets, C. W., Hsiao, C. C., Marks, T. J., & Facchetti, A. A. (2014). Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors. In Digest of Technical Papers - SID International Symposium (1 ed., Vol. 45, pp. 427-430). Blackwell Publishing Ltd. https://doi.org/10.1002/j.2168-0159.2014.tb00115.x

Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors. / Hsieh, Hsing Hung; Yu, Xinge; Xia, Yu; Sheets, Chris W.; Hsiao, Chung Chin; Marks, Tobin J; Facchetti, And Antonio.

Digest of Technical Papers - SID International Symposium. Vol. 45 1. ed. Blackwell Publishing Ltd, 2014. p. 427-430.

Research output: Chapter in Book/Report/Conference proceeding › Chapter

Hsieh, HH, Yu, X, Xia, Y, Sheets, CW, Hsiao, CC, Marks, TJ & Facchetti, AA 2014, Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors. in Digest of Technical Papers - SID International Symposium. 1 edn, vol. 45, Blackwell Publishing Ltd, pp. 427-430. https://doi.org/10.1002/j.2168-0159.2014.tb00115.x
Hsieh HH, Yu X, Xia Y, Sheets CW, Hsiao CC, Marks TJ et al. Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors. In Digest of Technical Papers - SID International Symposium. 1 ed. Vol. 45. Blackwell Publishing Ltd. 2014. p. 427-430 https://doi.org/10.1002/j.2168-0159.2014.tb00115.x
Hsieh, Hsing Hung ; Yu, Xinge ; Xia, Yu ; Sheets, Chris W. ; Hsiao, Chung Chin ; Marks, Tobin J ; Facchetti, And Antonio. / Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors. Digest of Technical Papers - SID International Symposium. Vol. 45 1. ed. Blackwell Publishing Ltd, 2014. pp. 427-430
@inbook{0fd851157a164360a51b22f6d0abd7c2,
title = "Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors",
abstract = "Novel approaches including combustion synthesis achieved via both spin-coating/post annealing and spray-coating/in-situ annealing can be used to generate high-quality metal oxide thin films, including IGZO, and high performance metal oxide TFTs at relatively low temperatures. Furthermore, we demonstrate metal oxide TFTs using proprietary solution-processed dielectric and passivation layers.",
keywords = "combustion synthesis, dielectric, IGZO, metal oxide TFT, solution process, spin coating with post annealing, spray coating with in-situ annealing",
author = "Hsieh, {Hsing Hung} and Xinge Yu and Yu Xia and Sheets, {Chris W.} and Hsiao, {Chung Chin} and Marks, {Tobin J} and Facchetti, {And Antonio}",
year = "2014",
doi = "10.1002/j.2168-0159.2014.tb00115.x",
language = "English",
volume = "45",
pages = "427--430",
booktitle = "Digest of Technical Papers - SID International Symposium",
publisher = "Blackwell Publishing Ltd",
edition = "1",

}

TY - CHAP

T1 - Novel approaches for fabricating high-performance low-temperature solution-processed metal oxide transistors

AU - Hsieh, Hsing Hung

AU - Yu, Xinge

AU - Xia, Yu

AU - Sheets, Chris W.

AU - Hsiao, Chung Chin

AU - Marks, Tobin J

AU - Facchetti, And Antonio

PY - 2014

Y1 - 2014

N2 - Novel approaches including combustion synthesis achieved via both spin-coating/post annealing and spray-coating/in-situ annealing can be used to generate high-quality metal oxide thin films, including IGZO, and high performance metal oxide TFTs at relatively low temperatures. Furthermore, we demonstrate metal oxide TFTs using proprietary solution-processed dielectric and passivation layers.

AB - Novel approaches including combustion synthesis achieved via both spin-coating/post annealing and spray-coating/in-situ annealing can be used to generate high-quality metal oxide thin films, including IGZO, and high performance metal oxide TFTs at relatively low temperatures. Furthermore, we demonstrate metal oxide TFTs using proprietary solution-processed dielectric and passivation layers.

KW - combustion synthesis

KW - dielectric

KW - IGZO

KW - metal oxide TFT

KW - solution process

KW - spin coating with post annealing

KW - spray coating with in-situ annealing

UR - http://www.scopus.com/inward/record.url?scp=84905047972&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84905047972&partnerID=8YFLogxK

U2 - 10.1002/j.2168-0159.2014.tb00115.x

DO - 10.1002/j.2168-0159.2014.tb00115.x

M3 - Chapter

AN - SCOPUS:84905047972

VL - 45

SP - 427

EP - 430

BT - Digest of Technical Papers - SID International Symposium

PB - Blackwell Publishing Ltd

ER -

Access to Document