Nucleation and growth of noble metals on oxide surfaces using atomic layer deposition

J. W. Elam, A. V. Zinovev, M. J. Pellin, D. J. Comstock, M. C. Hersam

Research output: Chapter in Book/Report/Conference proceedingConference contribution

40 Citations (Scopus)

Abstract

Noble metals supported on metal oxide surfaces have broad applications in catalysis, microelectronics and sensing. In most applications it is critical to control the dispersion and morphology of the noble metals to achieve either a smooth, continuous film or isolated particles of controlled size. Here we examine the atomic layer deposition of Pd and Pt films onto a variety of metal oxide surfaces including Al2O3, ZrO2, and TiO2. In situ quartz crystal microbalance measurements and quadrupole mass spectrometry are used to explore the nucleation and growth of the Pd and Pt on the different metal oxide surfaces. Scanning electron microscopy and X-ray photoelectron spectroscopy are used to examine the morphology and surface state of the resulting Pt and Pd coatings. By varying the support material and the deposition conditions, we can control the morphology of the ALD noble metal coatings to yield agglomerated particles or continuous films. copyright The Electrochemical Society.

Original languageEnglish
Title of host publicationECS Transactions - 2nd Symposium on Atomic Layer Deposition Applications
Pages271-278
Number of pages8
Edition15
DOIs
Publication statusPublished - Dec 1 2007
Event2nd Symposium on Atomic Layer Deposition Applications - 210th ECS Meeting - Cancun, Mexico
Duration: Oct 29 2006Nov 1 2006

Publication series

NameECS Transactions
Number15
Volume3
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other2nd Symposium on Atomic Layer Deposition Applications - 210th ECS Meeting
CountryMexico
CityCancun
Period10/29/0611/1/06

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Elam, J. W., Zinovev, A. V., Pellin, M. J., Comstock, D. J., & Hersam, M. C. (2007). Nucleation and growth of noble metals on oxide surfaces using atomic layer deposition. In ECS Transactions - 2nd Symposium on Atomic Layer Deposition Applications (15 ed., pp. 271-278). (ECS Transactions; Vol. 3, No. 15). https://doi.org/10.1149/1.2721496