Observation of (5×5) surface reconstruction on pure silicon and its stability against native-oxide Formation

A. Ourmazd, D. W. Taylor, J. Bevk, B. A. Davidson, Leonard C Feldman, J. P. Mannaerts

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We report the observation of a (5×5) reconstruction on the pure Si (111) surface, which is induced and stabilized by a tensile strain. The stabilization is so strong that the reconstruction survives extended exposure to air and the formation of a native oxide layer. Modeling of experimental high-resolution transmission-electron-microscope profile images indicates that the native oxide is ordered. The (5×5) reconstruction can also be induced at an initially unreconstructed Si-oxide interface by application of tension and appropriate annealing.

Original languageEnglish
Pages (from-to)1332-1335
Number of pages4
JournalPhysical Review Letters
Issue number11
Publication statusPublished - 1986


ASJC Scopus subject areas

  • Physics and Astronomy(all)

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