Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach

M. Akiyama, I. Alexandrou, Manish Chhowalla, G. A J Amaratunga

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We have investigated the effects of seven sputtering control factors on the hardness of carbon nitride (CNx) thin films by design of experiments and the analysis of variance (ANOVA) to synthesize hard CNx thin films. It was determined statistically that the substrate temperature, the sputtering pressure and the target to substrate distance are significant control factors for the hardness of the CNx thin films within the experimental range of this study. Especially, the distance is the most important control factor of the seven factors; the hardest films are obtained at the distance of 4.5 cm. On the other hand, the effects of the substrate treatment, the dc power, the nitrogen concentration and the sputtering time are not statistically significant. It is suggested that these statistical methods are effective to compare the importance of many sputtering control factors. The CNx thin films deposited under the optimized sputtering conditions exhibit a relatively high hardness value of 55 ± 11 GPa, Young's modulus of 228 ± 21 GPa and an elastic recovery (%R) of 98%. The compressive stress in the films is a low value of 0.3 GPa.

Original languageEnglish
Pages (from-to)5397-5401
Number of pages5
JournalJournal of Materials Science
Volume36
Issue number22
DOIs
Publication statusPublished - Nov 15 2001

Fingerprint

Magnetron sputtering
Sputtering
Hardness
Thin films
Substrates
Carbon nitride
Analysis of variance (ANOVA)
Compressive stress
Design of experiments
Statistical methods
Nitrogen
Elastic moduli
Recovery
Temperature

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach. / Akiyama, M.; Alexandrou, I.; Chhowalla, Manish; Amaratunga, G. A J.

In: Journal of Materials Science, Vol. 36, No. 22, 15.11.2001, p. 5397-5401.

Research output: Contribution to journalArticle

Akiyama, M. ; Alexandrou, I. ; Chhowalla, Manish ; Amaratunga, G. A J. / Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach. In: Journal of Materials Science. 2001 ; Vol. 36, No. 22. pp. 5397-5401.
@article{776a63e7b97c46d8825afcff9c61865c,
title = "Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach",
abstract = "We have investigated the effects of seven sputtering control factors on the hardness of carbon nitride (CNx) thin films by design of experiments and the analysis of variance (ANOVA) to synthesize hard CNx thin films. It was determined statistically that the substrate temperature, the sputtering pressure and the target to substrate distance are significant control factors for the hardness of the CNx thin films within the experimental range of this study. Especially, the distance is the most important control factor of the seven factors; the hardest films are obtained at the distance of 4.5 cm. On the other hand, the effects of the substrate treatment, the dc power, the nitrogen concentration and the sputtering time are not statistically significant. It is suggested that these statistical methods are effective to compare the importance of many sputtering control factors. The CNx thin films deposited under the optimized sputtering conditions exhibit a relatively high hardness value of 55 ± 11 GPa, Young's modulus of 228 ± 21 GPa and an elastic recovery ({\%}R) of 98{\%}. The compressive stress in the films is a low value of 0.3 GPa.",
author = "M. Akiyama and I. Alexandrou and Manish Chhowalla and Amaratunga, {G. A J}",
year = "2001",
month = "11",
day = "15",
doi = "10.1023/A:1012461026119",
language = "English",
volume = "36",
pages = "5397--5401",
journal = "Journal of Materials Science",
issn = "0022-2461",
publisher = "Springer Netherlands",
number = "22",

}

TY - JOUR

T1 - Optimizing hardness of CNx thin films by dc magnetron sputtering and a statistical approach

AU - Akiyama, M.

AU - Alexandrou, I.

AU - Chhowalla, Manish

AU - Amaratunga, G. A J

PY - 2001/11/15

Y1 - 2001/11/15

N2 - We have investigated the effects of seven sputtering control factors on the hardness of carbon nitride (CNx) thin films by design of experiments and the analysis of variance (ANOVA) to synthesize hard CNx thin films. It was determined statistically that the substrate temperature, the sputtering pressure and the target to substrate distance are significant control factors for the hardness of the CNx thin films within the experimental range of this study. Especially, the distance is the most important control factor of the seven factors; the hardest films are obtained at the distance of 4.5 cm. On the other hand, the effects of the substrate treatment, the dc power, the nitrogen concentration and the sputtering time are not statistically significant. It is suggested that these statistical methods are effective to compare the importance of many sputtering control factors. The CNx thin films deposited under the optimized sputtering conditions exhibit a relatively high hardness value of 55 ± 11 GPa, Young's modulus of 228 ± 21 GPa and an elastic recovery (%R) of 98%. The compressive stress in the films is a low value of 0.3 GPa.

AB - We have investigated the effects of seven sputtering control factors on the hardness of carbon nitride (CNx) thin films by design of experiments and the analysis of variance (ANOVA) to synthesize hard CNx thin films. It was determined statistically that the substrate temperature, the sputtering pressure and the target to substrate distance are significant control factors for the hardness of the CNx thin films within the experimental range of this study. Especially, the distance is the most important control factor of the seven factors; the hardest films are obtained at the distance of 4.5 cm. On the other hand, the effects of the substrate treatment, the dc power, the nitrogen concentration and the sputtering time are not statistically significant. It is suggested that these statistical methods are effective to compare the importance of many sputtering control factors. The CNx thin films deposited under the optimized sputtering conditions exhibit a relatively high hardness value of 55 ± 11 GPa, Young's modulus of 228 ± 21 GPa and an elastic recovery (%R) of 98%. The compressive stress in the films is a low value of 0.3 GPa.

UR - http://www.scopus.com/inward/record.url?scp=0035891108&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035891108&partnerID=8YFLogxK

U2 - 10.1023/A:1012461026119

DO - 10.1023/A:1012461026119

M3 - Article

AN - SCOPUS:0035891108

VL - 36

SP - 5397

EP - 5401

JO - Journal of Materials Science

JF - Journal of Materials Science

SN - 0022-2461

IS - 22

ER -