Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH2 Metal–Organic Framework

Gregory W. Peterson; Matthew R. Destefano; Sergio J. Garibay; Ann Ploskonka; Monica McEntee; Morgan Hall; Christopher J. Karwacki; Joseph T. Hupp; Omar K. Farha

doi:10.1002/chem.201704525

Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH₂ Metal–Organic Framework

Gregory W. Peterson, Matthew R. Destefano, Sergio J. Garibay, Ann Ploskonka, Monica McEntee, Morgan Hall, Christopher J. Karwacki, Joseph T. Hupp, Omar K. Farha

Northwestern University

Research output: Contribution to journal › Article

30 Citations (Scopus)

Abstract

For the first time, an increasing number of defects were introduced to the metal–organic framework UiO-66-NH₂ in an attempt to understand the structure–activity trade-offs associated with toxic chemical removal. It was found that an optimum exists with moderate defects for toxic chemicals that react with the linker, whereas those that require hydrolysis at the secondary building unit performed better when more defects were introduced. The insights obtained through this work highlight the ability to dial-in appropriate material formulations, even within the same parent metal–organic framework, allowing for trade-offs between reaction efficiency and mass transfer.

Original language	English
Pages (from-to)	15913-15916
Number of pages	4
Journal	Chemistry - A European Journal
Volume	23
Issue number	63
DOIs	https://doi.org/10.1002/chem.201704525
Publication status	Published - Nov 13 2017

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Keywords

adsorption
chemical warfare agents
defects
metal–organic frameworks
toxic chemicals

ASJC Scopus subject areas

Catalysis
Organic Chemistry

Cite this

Peterson, G. W., Destefano, M. R., Garibay, S. J., Ploskonka, A., McEntee, M., Hall, M., Karwacki, C. J., Hupp, J. T., & Farha, O. K. (2017). Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH₂ Metal–Organic Framework. Chemistry - A European Journal, 23(63), 15913-15916. https://doi.org/10.1002/chem.201704525

Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH₂ Metal–Organic Framework. / Peterson, Gregory W.; Destefano, Matthew R.; Garibay, Sergio J.; Ploskonka, Ann; McEntee, Monica; Hall, Morgan; Karwacki, Christopher J.; Hupp, Joseph T.; Farha, Omar K.

In: Chemistry - A European Journal, Vol. 23, No. 63, 13.11.2017, p. 15913-15916.

Research output: Contribution to journal › Article

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10.1002/chem.201704525