Ordered monolayer structures of boron in Si(111) and Si(100)

B. E. Weir; A. F J Levi; B. Freer; J. Bevk; Leonard C Feldman

doi:10.1116/1.577307

Ordered monolayer structures of boron in Si(111) and Si(100)

B. E. Weir, A. F J Levi, B. Freer, J. Bevk, Leonard C Feldman

Rutgers University

Research output: Contribution to journal › Article

17 Citations (Scopus)

Abstract

We have prepared metastable, ordered monolayer structures of boron on Si (100) and Si (111) by silicon deposition atop unique surface reconstructions. These superlattice structures suggest possibilities for monolayer doping and ordered alloy structures with new electronic properties. In this paper we summarize our recent results in forming ordered structures and the electrical properties of the preserved layers.

Original language	English
Pages (from-to)	2269-2272
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	9
Issue number	4
DOIs	https://doi.org/10.1116/1.577307
Publication status	Published - 1991

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ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Cite this

Weir, B. E., Levi, A. F. J., Freer, B., Bevk, J., & Feldman, L. C. (1991). Ordered monolayer structures of boron in Si(111) and Si(100). Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 9(4), 2269-2272. https://doi.org/10.1116/1.577307

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10.1116/1.577307