Ordered monolayer structures of boron in Si(111) and Si(100)

B. E. Weir, A. F J Levi, B. Freer, J. Bevk, Leonard C Feldman

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

We have prepared metastable, ordered monolayer structures of boron on Si (100) and Si (111) by silicon deposition atop unique surface reconstructions. These superlattice structures suggest possibilities for monolayer doping and ordered alloy structures with new electronic properties. In this paper we summarize our recent results in forming ordered structures and the electrical properties of the preserved layers.

Original languageEnglish
Pages (from-to)2269-2272
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume9
Issue number4
DOIs
Publication statusPublished - 1991

Fingerprint

Boron
Monolayers
boron
electrical properties
Surface reconstruction
silicon
Silicon
electronics
Electronic properties
Electric properties
Doping (additives)

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Ordered monolayer structures of boron in Si(111) and Si(100). / Weir, B. E.; Levi, A. F J; Freer, B.; Bevk, J.; Feldman, Leonard C.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 9, No. 4, 1991, p. 2269-2272.

Research output: Contribution to journalArticle

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