Ordered silicon microwire arrays grown from substrates patterned using imprint lithography and electrodeposition

Heather A. Audesirk, Emily L. Warren, Jessie Ku, Nathan S Lewis

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Silicon microwires grown by the vapor-liquid-solid process have attracted a great deal of interest as potential light absorbers for solar energy conversion. However, the research-scale techniques that have been demonstrated to produce ordered arrays of micro and nanowires may not be optimal for use as high-throughput processes needed for large-scale manufacturing. Herein we demonstrate the use of microimprint lithography to fabricate patterned templates for the confinement of an electrodeposited Cu catalyst for the vapor-liquid-solid (VLS) growth of Si microwires. A reusable polydimethylsiloxane stamp was used to pattern holes in silica sol-gels on silicon substrates, and the Cu catalyst was electrodeposited into the holes. Ordered arrays of crystalline p-type Si microwires were grown across the sol-gel-patterned substrates with materials quality and performance comparable to microwires fabricated with high-purity metal catalysts and cleanroom processing.

Original languageEnglish
Pages (from-to)1396-1400
Number of pages5
JournalACS Applied Materials and Interfaces
Volume7
Issue number3
DOIs
Publication statusPublished - Jan 28 2015

Fingerprint

Silicon
Electrodeposition
Lithography
Catalysts
Sol-gels
Substrates
Vapors
Liquids
Polydimethylsiloxane
Energy conversion
Silicon Dioxide
Solar energy
Nanowires
Metals
Silica
Throughput
Crystalline materials
Processing

Keywords

  • electrodeposition
  • imprint lithography
  • photoelectrochemistry
  • silicon microwire
  • VLS

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Ordered silicon microwire arrays grown from substrates patterned using imprint lithography and electrodeposition. / Audesirk, Heather A.; Warren, Emily L.; Ku, Jessie; Lewis, Nathan S.

In: ACS Applied Materials and Interfaces, Vol. 7, No. 3, 28.01.2015, p. 1396-1400.

Research output: Contribution to journalArticle

@article{082188c7abe14264ab97ec45922c399f,
title = "Ordered silicon microwire arrays grown from substrates patterned using imprint lithography and electrodeposition",
abstract = "Silicon microwires grown by the vapor-liquid-solid process have attracted a great deal of interest as potential light absorbers for solar energy conversion. However, the research-scale techniques that have been demonstrated to produce ordered arrays of micro and nanowires may not be optimal for use as high-throughput processes needed for large-scale manufacturing. Herein we demonstrate the use of microimprint lithography to fabricate patterned templates for the confinement of an electrodeposited Cu catalyst for the vapor-liquid-solid (VLS) growth of Si microwires. A reusable polydimethylsiloxane stamp was used to pattern holes in silica sol-gels on silicon substrates, and the Cu catalyst was electrodeposited into the holes. Ordered arrays of crystalline p-type Si microwires were grown across the sol-gel-patterned substrates with materials quality and performance comparable to microwires fabricated with high-purity metal catalysts and cleanroom processing.",
keywords = "electrodeposition, imprint lithography, photoelectrochemistry, silicon microwire, VLS",
author = "Audesirk, {Heather A.} and Warren, {Emily L.} and Jessie Ku and Lewis, {Nathan S}",
year = "2015",
month = "1",
day = "28",
doi = "10.1021/am507200j",
language = "English",
volume = "7",
pages = "1396--1400",
journal = "ACS applied materials & interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
number = "3",

}

TY - JOUR

T1 - Ordered silicon microwire arrays grown from substrates patterned using imprint lithography and electrodeposition

AU - Audesirk, Heather A.

AU - Warren, Emily L.

AU - Ku, Jessie

AU - Lewis, Nathan S

PY - 2015/1/28

Y1 - 2015/1/28

N2 - Silicon microwires grown by the vapor-liquid-solid process have attracted a great deal of interest as potential light absorbers for solar energy conversion. However, the research-scale techniques that have been demonstrated to produce ordered arrays of micro and nanowires may not be optimal for use as high-throughput processes needed for large-scale manufacturing. Herein we demonstrate the use of microimprint lithography to fabricate patterned templates for the confinement of an electrodeposited Cu catalyst for the vapor-liquid-solid (VLS) growth of Si microwires. A reusable polydimethylsiloxane stamp was used to pattern holes in silica sol-gels on silicon substrates, and the Cu catalyst was electrodeposited into the holes. Ordered arrays of crystalline p-type Si microwires were grown across the sol-gel-patterned substrates with materials quality and performance comparable to microwires fabricated with high-purity metal catalysts and cleanroom processing.

AB - Silicon microwires grown by the vapor-liquid-solid process have attracted a great deal of interest as potential light absorbers for solar energy conversion. However, the research-scale techniques that have been demonstrated to produce ordered arrays of micro and nanowires may not be optimal for use as high-throughput processes needed for large-scale manufacturing. Herein we demonstrate the use of microimprint lithography to fabricate patterned templates for the confinement of an electrodeposited Cu catalyst for the vapor-liquid-solid (VLS) growth of Si microwires. A reusable polydimethylsiloxane stamp was used to pattern holes in silica sol-gels on silicon substrates, and the Cu catalyst was electrodeposited into the holes. Ordered arrays of crystalline p-type Si microwires were grown across the sol-gel-patterned substrates with materials quality and performance comparable to microwires fabricated with high-purity metal catalysts and cleanroom processing.

KW - electrodeposition

KW - imprint lithography

KW - photoelectrochemistry

KW - silicon microwire

KW - VLS

UR - http://www.scopus.com/inward/record.url?scp=84921717868&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84921717868&partnerID=8YFLogxK

U2 - 10.1021/am507200j

DO - 10.1021/am507200j

M3 - Article

VL - 7

SP - 1396

EP - 1400

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

SN - 1944-8244

IS - 3

ER -