Organometallic chemical vapor deposition of high Tc superconducting films using a volatile, fluorocarbon-based precursor

Jing Zhao, Klaus Hermann Dahmen, Henry O. Marcy, Lauren M. Tonge, Tobin J. Marks, Bruce W. Wessels, Carl R. Kannewurf

Research output: Contribution to journalArticlepeer-review

96 Citations (Scopus)


Uniform films of the high Tc superconductor YBa 2Cu3O7-δ have been prepared by organometallic chemical vapor deposition using the volatile metalorganic precursors Cu(acetylacetonate)2, Y(dipivaloylmethanate)3, and Ba(heptafluorodimethyloctanedionate)2. With argon as a carrier gas and water vapor as a reactant, film growth rates of 10-30 nm/min are achieved. After annealing under oxygen, energy dispersive x-ray analysis, profilometry, and x-ray diffraction data reveal that such YBa2Cu 3O7-δ films on [100] single-crystal MgO have good compositional and dimensional uniformity as well as preferential orientation of crystallite c axes perpendicular to the substrate surface. Four-probe resistivity measurements reveal the onset of superconductivity at ∼90 K and zero resistance by 66.2 K.

Original languageEnglish
Pages (from-to)1750-1752
Number of pages3
JournalApplied Physics Letters
Issue number18
Publication statusPublished - 1988

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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