Organometallic chemical vapor deposition of high Tc superconducting films using a volatile, fluorocarbon-based precursor

Jing Zhao, Klaus Hermann Dahmen, Henry O. Marcy, Lauren M. Tonge, Tobin J Marks, Bruce W. Wessels, Carl R. Kannewurf

Research output: Contribution to journalArticle

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Abstract

Uniform films of the high Tc superconductor YBa 2Cu3O7-δ have been prepared by organometallic chemical vapor deposition using the volatile metalorganic precursors Cu(acetylacetonate)2, Y(dipivaloylmethanate)3, and Ba(heptafluorodimethyloctanedionate)2. With argon as a carrier gas and water vapor as a reactant, film growth rates of 10-30 nm/min are achieved. After annealing under oxygen, energy dispersive x-ray analysis, profilometry, and x-ray diffraction data reveal that such YBa2Cu 3O7-δ films on [100] single-crystal MgO have good compositional and dimensional uniformity as well as preferential orientation of crystallite c axes perpendicular to the substrate surface. Four-probe resistivity measurements reveal the onset of superconductivity at ∼90 K and zero resistance by 66.2 K.

Original languageEnglish
Pages (from-to)1750-1752
Number of pages3
JournalApplied Physics Letters
Volume53
Issue number18
DOIs
Publication statusPublished - 1988

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fluorocarbons
superconducting films
vapor deposition
x ray analysis
water vapor
x ray diffraction
superconductivity
argon
vapors
electrical resistivity
annealing
probes
single crystals
oxygen
gases
energy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Organometallic chemical vapor deposition of high Tc superconducting films using a volatile, fluorocarbon-based precursor. / Zhao, Jing; Dahmen, Klaus Hermann; Marcy, Henry O.; Tonge, Lauren M.; Marks, Tobin J; Wessels, Bruce W.; Kannewurf, Carl R.

In: Applied Physics Letters, Vol. 53, No. 18, 1988, p. 1750-1752.

Research output: Contribution to journalArticle

Zhao, Jing ; Dahmen, Klaus Hermann ; Marcy, Henry O. ; Tonge, Lauren M. ; Marks, Tobin J ; Wessels, Bruce W. ; Kannewurf, Carl R. / Organometallic chemical vapor deposition of high Tc superconducting films using a volatile, fluorocarbon-based precursor. In: Applied Physics Letters. 1988 ; Vol. 53, No. 18. pp. 1750-1752.
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AU - Marks, Tobin J

AU - Wessels, Bruce W.

AU - Kannewurf, Carl R.

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