Organometallic chemical vapor deposition of high Tc superconducting Bi-Sr-Ca-Cu-O films

Jiming Zhang, Jing Zhao, Henry O. Marcy, Lauren M. Tonge, Bruce W. Wessels, Tobin J Marks, Carl R. Kannewurf

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Abstract

Films of the high Tc Bi-Sr-Ca-Cu-O superconductor have been prepared by organometallic chemical vapor deposition using the volatile metalorganic precursors Cu(acetylacetonate)2, Sr(dipivaloylmethanate) 2, and Ca(dipivaloylmethanate)2, and triphenylbismuth. Deposition is carried out at 2 Torr with argon as the carrier gas and oxygen and water vapor as reactants. Film growth rates of 2-3 μm/h are achieved. After annealing under oxygen, energy dispersive x-ray analysis and x-ray diffraction data reveal that such films on [100] single-crystal MgO consist predominantly of the Bi2(Sr,Ca)3Cu2Ox, T c=85 K, phase and have preferential orientation of the crystallite c axes perpendicular to the substrate surface. Four-probe resistivity measurements reveal the onset of film superconductivity at ∼110 K and zero resistance by 75 K.

Original languageEnglish
Pages (from-to)1166-1168
Number of pages3
JournalApplied Physics Letters
Volume54
Issue number12
DOIs
Publication statusPublished - 1989

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Zhang, J., Zhao, J., Marcy, H. O., Tonge, L. M., Wessels, B. W., Marks, T. J., & Kannewurf, C. R. (1989). Organometallic chemical vapor deposition of high Tc superconducting Bi-Sr-Ca-Cu-O films. Applied Physics Letters, 54(12), 1166-1168. https://doi.org/10.1063/1.101481