Oxidation of Planar and Plasmonic Ag Surfaces by Exposure to O2/Ar Plasma for Organic Optoelectronic Applications

Christopher E. Petoukhoff, Catherine Antonick, M. Bala Murali Krishna, Keshav M. Dani, Deirdre M O'Carroll

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Here, we expose planar and plasmonic Ag surfaces to a low-power O2/Ar plasma to form an ultrathin surface oxide layer. We study the chemical state and morphology of the plasma-treated Ag surfaces using X-ray photoelectron spectroscopy, scanning electron microscopy, and dark-field microscopy. We observe the formation of an ultrathin layer (< 10 nm) composed of both AgO x and Ag2CO3 for a plasma exposure time of 1 s by investigating shifts in the Ag3d, O1s, and C1s core level binding energies. For an exposure time of 1 s, the surface structure of the planar and plasmonic Ag surfaces remains unchanged. For exposure times of 5 - 30 s, the planar Ag surfaces become porous and exhibit increased surface roughness. We demonstrate that the plasma-treated planar and plasmonic Ag surfaces lead to improvements in the excited-state population of a polymer:fullerene coating through ultrafast pump-probe reflectometry.

Original languageEnglish
Pages (from-to)943-948
Number of pages6
JournalMRS Advances
Volume1
Issue number14
DOIs
Publication statusPublished - Jan 1 2016

Fingerprint

Optoelectronic devices
Plasmas
Oxidation
oxidation
Fullerenes
Core levels
Binding energy
Excited states
Surface structure
Oxides
Microscopic examination
Polymers
X ray photoelectron spectroscopy
fullerenes
Surface roughness
Pumps
surface roughness
binding energy
Coatings
photoelectron spectroscopy

Keywords

  • optoelectronic
  • oxidation
  • x-ray photoelectron spectroscopy (XPS)

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Oxidation of Planar and Plasmonic Ag Surfaces by Exposure to O2/Ar Plasma for Organic Optoelectronic Applications. / Petoukhoff, Christopher E.; Antonick, Catherine; Bala Murali Krishna, M.; Dani, Keshav M.; O'Carroll, Deirdre M.

In: MRS Advances, Vol. 1, No. 14, 01.01.2016, p. 943-948.

Research output: Contribution to journalArticle

Petoukhoff, Christopher E. ; Antonick, Catherine ; Bala Murali Krishna, M. ; Dani, Keshav M. ; O'Carroll, Deirdre M. / Oxidation of Planar and Plasmonic Ag Surfaces by Exposure to O2/Ar Plasma for Organic Optoelectronic Applications. In: MRS Advances. 2016 ; Vol. 1, No. 14. pp. 943-948.
@article{9fb83879f33d4daf82242a4e45aefd4c,
title = "Oxidation of Planar and Plasmonic Ag Surfaces by Exposure to O2/Ar Plasma for Organic Optoelectronic Applications",
abstract = "Here, we expose planar and plasmonic Ag surfaces to a low-power O2/Ar plasma to form an ultrathin surface oxide layer. We study the chemical state and morphology of the plasma-treated Ag surfaces using X-ray photoelectron spectroscopy, scanning electron microscopy, and dark-field microscopy. We observe the formation of an ultrathin layer (< 10 nm) composed of both AgO x and Ag2CO3 for a plasma exposure time of 1 s by investigating shifts in the Ag3d, O1s, and C1s core level binding energies. For an exposure time of 1 s, the surface structure of the planar and plasmonic Ag surfaces remains unchanged. For exposure times of 5 - 30 s, the planar Ag surfaces become porous and exhibit increased surface roughness. We demonstrate that the plasma-treated planar and plasmonic Ag surfaces lead to improvements in the excited-state population of a polymer:fullerene coating through ultrafast pump-probe reflectometry.",
keywords = "optoelectronic, oxidation, x-ray photoelectron spectroscopy (XPS)",
author = "Petoukhoff, {Christopher E.} and Catherine Antonick and {Bala Murali Krishna}, M. and Dani, {Keshav M.} and O'Carroll, {Deirdre M}",
year = "2016",
month = "1",
day = "1",
doi = "10.1557/adv.2016.83",
language = "English",
volume = "1",
pages = "943--948",
journal = "MRS Advances",
issn = "2059-8521",
number = "14",

}

TY - JOUR

T1 - Oxidation of Planar and Plasmonic Ag Surfaces by Exposure to O2/Ar Plasma for Organic Optoelectronic Applications

AU - Petoukhoff, Christopher E.

AU - Antonick, Catherine

AU - Bala Murali Krishna, M.

AU - Dani, Keshav M.

AU - O'Carroll, Deirdre M

PY - 2016/1/1

Y1 - 2016/1/1

N2 - Here, we expose planar and plasmonic Ag surfaces to a low-power O2/Ar plasma to form an ultrathin surface oxide layer. We study the chemical state and morphology of the plasma-treated Ag surfaces using X-ray photoelectron spectroscopy, scanning electron microscopy, and dark-field microscopy. We observe the formation of an ultrathin layer (< 10 nm) composed of both AgO x and Ag2CO3 for a plasma exposure time of 1 s by investigating shifts in the Ag3d, O1s, and C1s core level binding energies. For an exposure time of 1 s, the surface structure of the planar and plasmonic Ag surfaces remains unchanged. For exposure times of 5 - 30 s, the planar Ag surfaces become porous and exhibit increased surface roughness. We demonstrate that the plasma-treated planar and plasmonic Ag surfaces lead to improvements in the excited-state population of a polymer:fullerene coating through ultrafast pump-probe reflectometry.

AB - Here, we expose planar and plasmonic Ag surfaces to a low-power O2/Ar plasma to form an ultrathin surface oxide layer. We study the chemical state and morphology of the plasma-treated Ag surfaces using X-ray photoelectron spectroscopy, scanning electron microscopy, and dark-field microscopy. We observe the formation of an ultrathin layer (< 10 nm) composed of both AgO x and Ag2CO3 for a plasma exposure time of 1 s by investigating shifts in the Ag3d, O1s, and C1s core level binding energies. For an exposure time of 1 s, the surface structure of the planar and plasmonic Ag surfaces remains unchanged. For exposure times of 5 - 30 s, the planar Ag surfaces become porous and exhibit increased surface roughness. We demonstrate that the plasma-treated planar and plasmonic Ag surfaces lead to improvements in the excited-state population of a polymer:fullerene coating through ultrafast pump-probe reflectometry.

KW - optoelectronic

KW - oxidation

KW - x-ray photoelectron spectroscopy (XPS)

UR - http://www.scopus.com/inward/record.url?scp=85041333299&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85041333299&partnerID=8YFLogxK

U2 - 10.1557/adv.2016.83

DO - 10.1557/adv.2016.83

M3 - Article

VL - 1

SP - 943

EP - 948

JO - MRS Advances

JF - MRS Advances

SN - 2059-8521

IS - 14

ER -