Abstract
The thermogravimetric method is used to study the oxidation properties of plasma grown diamond films both with and without fluorine. The oxidation experiments occur over a temperature range of 600-800 °C in pure oxygen at atmospheric pressure. Diamond films with fluorine are found more resistant (by a factor of 4 at 700 °C) to oxidation. The activation energy for oxidation, however, is a factor of at least 2.3 lower for fluorinated diamond films. Consequently, it is postulated that oxidation mechanisms for diamond films are quite different depending upon the fluorine content. Oxidation on nonfluorinated diamond films seem to proceed as a rate-limited reaction while the oxidation of fluorinated films seems to be a diffusion limited reaction. Oxidation rates are also found to depend weakly on film density, crystal texture, and phase composition of the diamond films.
| Original language | English |
|---|---|
| Pages (from-to) | 745-747 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 59 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1991 |
Fingerprint
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Cite this
Oxidation studies of fluorine containing diamond films. / Grannen, K. J.; Tsu, D. V.; Meilunas, R. J.; Chang, Robert P. H.
In: Applied Physics Letters, Vol. 59, No. 6, 1991, p. 745-747.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Oxidation studies of fluorine containing diamond films
AU - Grannen, K. J.
AU - Tsu, D. V.
AU - Meilunas, R. J.
AU - Chang, Robert P. H.
PY - 1991
Y1 - 1991
N2 - The thermogravimetric method is used to study the oxidation properties of plasma grown diamond films both with and without fluorine. The oxidation experiments occur over a temperature range of 600-800 °C in pure oxygen at atmospheric pressure. Diamond films with fluorine are found more resistant (by a factor of 4 at 700 °C) to oxidation. The activation energy for oxidation, however, is a factor of at least 2.3 lower for fluorinated diamond films. Consequently, it is postulated that oxidation mechanisms for diamond films are quite different depending upon the fluorine content. Oxidation on nonfluorinated diamond films seem to proceed as a rate-limited reaction while the oxidation of fluorinated films seems to be a diffusion limited reaction. Oxidation rates are also found to depend weakly on film density, crystal texture, and phase composition of the diamond films.
AB - The thermogravimetric method is used to study the oxidation properties of plasma grown diamond films both with and without fluorine. The oxidation experiments occur over a temperature range of 600-800 °C in pure oxygen at atmospheric pressure. Diamond films with fluorine are found more resistant (by a factor of 4 at 700 °C) to oxidation. The activation energy for oxidation, however, is a factor of at least 2.3 lower for fluorinated diamond films. Consequently, it is postulated that oxidation mechanisms for diamond films are quite different depending upon the fluorine content. Oxidation on nonfluorinated diamond films seem to proceed as a rate-limited reaction while the oxidation of fluorinated films seems to be a diffusion limited reaction. Oxidation rates are also found to depend weakly on film density, crystal texture, and phase composition of the diamond films.
UR - http://www.scopus.com/inward/record.url?scp=0345586920&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0345586920&partnerID=8YFLogxK
U2 - 10.1063/1.105331
DO - 10.1063/1.105331
M3 - Article
AN - SCOPUS:0345586920
VL - 59
SP - 745
EP - 747
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 6
ER -