Performance of thin film carbon materials and carbon nanotubes as cold cathodes

G. A J Amaratunga, M. Baxendale, N. Rupasinghe, D. A I Munindradasa, Manish Chhowalla, T. Butler

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.

Original languageEnglish
Title of host publicationProceedings of the IEEE International Vacuum Microelectronics Conference, IVMC
PublisherIEEE
Pages184-185
Number of pages2
Publication statusPublished - 1998
EventProceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC - Asheville, NC, USA
Duration: Jul 19 1998Jul 24 1998

Other

OtherProceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC
CityAsheville, NC, USA
Period7/19/987/24/98

Fingerprint

cold cathodes
nanotubes
carbon nanotubes
carbon
thin films
drying
field emission
alcohols
arcs
anions
porosity
electric potential

ASJC Scopus subject areas

  • Surfaces and Interfaces

Cite this

Amaratunga, G. A. J., Baxendale, M., Rupasinghe, N., Munindradasa, D. A. I., Chhowalla, M., & Butler, T. (1998). Performance of thin film carbon materials and carbon nanotubes as cold cathodes. In Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC (pp. 184-185). IEEE.

Performance of thin film carbon materials and carbon nanotubes as cold cathodes. / Amaratunga, G. A J; Baxendale, M.; Rupasinghe, N.; Munindradasa, D. A I; Chhowalla, Manish; Butler, T.

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, 1998. p. 184-185.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Amaratunga, GAJ, Baxendale, M, Rupasinghe, N, Munindradasa, DAI, Chhowalla, M & Butler, T 1998, Performance of thin film carbon materials and carbon nanotubes as cold cathodes. in Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, pp. 184-185, Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC, Asheville, NC, USA, 7/19/98.
Amaratunga GAJ, Baxendale M, Rupasinghe N, Munindradasa DAI, Chhowalla M, Butler T. Performance of thin film carbon materials and carbon nanotubes as cold cathodes. In Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE. 1998. p. 184-185
Amaratunga, G. A J ; Baxendale, M. ; Rupasinghe, N. ; Munindradasa, D. A I ; Chhowalla, Manish ; Butler, T. / Performance of thin film carbon materials and carbon nanotubes as cold cathodes. Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, 1998. pp. 184-185
@inproceedings{828c278c58c94bcc89073dd12426440f,
title = "Performance of thin film carbon materials and carbon nanotubes as cold cathodes",
abstract = "The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at {\%}; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.",
author = "Amaratunga, {G. A J} and M. Baxendale and N. Rupasinghe and Munindradasa, {D. A I} and Manish Chhowalla and T. Butler",
year = "1998",
language = "English",
pages = "184--185",
booktitle = "Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC",
publisher = "IEEE",

}

TY - GEN

T1 - Performance of thin film carbon materials and carbon nanotubes as cold cathodes

AU - Amaratunga, G. A J

AU - Baxendale, M.

AU - Rupasinghe, N.

AU - Munindradasa, D. A I

AU - Chhowalla, Manish

AU - Butler, T.

PY - 1998

Y1 - 1998

N2 - The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.

AB - The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.

UR - http://www.scopus.com/inward/record.url?scp=0032309241&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032309241&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0032309241

SP - 184

EP - 185

BT - Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC

PB - IEEE

ER -