Abstract
The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC |
| Publisher | IEEE |
| Pages | 184-185 |
| Number of pages | 2 |
| Publication status | Published - 1998 |
| Event | Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC - Asheville, NC, USA Duration: Jul 19 1998 → Jul 24 1998 |
Other
| Other | Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC |
|---|---|
| City | Asheville, NC, USA |
| Period | 7/19/98 → 7/24/98 |
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ASJC Scopus subject areas
- Surfaces and Interfaces
Cite this
Performance of thin film carbon materials and carbon nanotubes as cold cathodes. / Amaratunga, G. A J; Baxendale, M.; Rupasinghe, N.; Munindradasa, D. A I; Chhowalla, Manish; Butler, T.
Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, 1998. p. 184-185.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Performance of thin film carbon materials and carbon nanotubes as cold cathodes
AU - Amaratunga, G. A J
AU - Baxendale, M.
AU - Rupasinghe, N.
AU - Munindradasa, D. A I
AU - Chhowalla, Manish
AU - Butler, T.
PY - 1998
Y1 - 1998
N2 - The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.
AB - The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.
UR - http://www.scopus.com/inward/record.url?scp=0032309241&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0032309241&partnerID=8YFLogxK
M3 - Conference contribution
SP - 184
EP - 185
BT - Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC
PB - IEEE
ER -