Abstract
The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.
Original language | English |
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Pages | 184-185 |
Number of pages | 2 |
Publication status | Published - Dec 1 1998 |
Event | Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC - Asheville, NC, USA Duration: Jul 19 1998 → Jul 24 1998 |
Other
Other | Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC |
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City | Asheville, NC, USA |
Period | 7/19/98 → 7/24/98 |
ASJC Scopus subject areas
- Surfaces and Interfaces