Performance of thin film carbon materials and carbon nanotubes as cold cathodes

G. A.J. Amaratunga; M. Baxendale; N. Rupasinghe; D. A.I. Munindradasa; M. Chhowalla; T. Butler

Performance of thin film carbon materials and carbon nanotubes as cold cathodes

G. A.J. Amaratunga, M. Baxendale, N. Rupasinghe, D. A.I. Munindradasa, M. Chhowalla, T. Butler

Rutgers University

Research output: Contribution to conference › Paper › peer-review

2 Citations (Scopus)

Abstract

The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.

Original language	English
Pages	184-185
Number of pages	2
Publication status	Published - Dec 1 1998
Event	Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC - Asheville, NC, USA Duration: Jul 19 1998 → Jul 24 1998

Other

Other	Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC
City	Asheville, NC, USA
Period	7/19/98 → 7/24/98

ASJC Scopus subject areas

Surfaces and Interfaces

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Performance of thin film carbon materials and carbon nanotubes as cold cathodes. / Amaratunga, G. A.J.; Baxendale, M.; Rupasinghe, N.; Munindradasa, D. A.I.; Chhowalla, M.; Butler, T.

1998. 184-185 Paper presented at Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC, Asheville, NC, USA, .

Research output: Contribution to conference › Paper › peer-review

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AU - Amaratunga, G. A.J.

AU - Baxendale, M.

AU - Rupasinghe, N.

AU - Munindradasa, D. A.I.

AU - Chhowalla, M.

AU - Butler, T.

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