Abstract
The field emissions from three different types of carbon films are studied using a Kiethly voltage-current source-measure unit under computer control. The three types of carbon films are : 1) a-C:H:N deposited using an inductively coupled rf PECVD process, where the N content in the films can be as high as 30 at %; 2) cathodic arc deposited tetrahedral amorphous carbon with embedded regions of carbon nanotube and anion structures and 3) unoriented carbon nanotube films on a porous substrate. The films are formed by filtering a solution of nanotubes dispersed in alcohol through the pores and drying.
| Original language | English |
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| Pages | 184-185 |
| Number of pages | 2 |
| Publication status | Published - Dec 1 1998 |
| Event | Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC - Asheville, NC, USA Duration: Jul 19 1998 → Jul 24 1998 |
Other
| Other | Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC |
|---|---|
| City | Asheville, NC, USA |
| Period | 7/19/98 → 7/24/98 |
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ASJC Scopus subject areas
- Surfaces and Interfaces
Cite this
Amaratunga, G. A. J., Baxendale, M., Rupasinghe, N., Munindradasa, D. A. I., Chhowalla, M., & Butler, T. (1998). Performance of thin film carbon materials and carbon nanotubes as cold cathodes. 184-185. Paper presented at Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC, Asheville, NC, USA, .