Abstract
We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a "double-molecular-layer" model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature.
| Original language | English |
|---|---|
| Article number | 024714 |
| Journal | Journal of Chemical Physics |
| Volume | 124 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2006 |
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ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
Cite this
Phase of molecular ink in nanoscale direct deposition processes. / Cho, Narae; Ryu, Seol; Kim, Byeongju; Schatz, George C; Hong, Seunghun.
In: Journal of Chemical Physics, Vol. 124, No. 2, 024714, 2006.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Phase of molecular ink in nanoscale direct deposition processes
AU - Cho, Narae
AU - Ryu, Seol
AU - Kim, Byeongju
AU - Schatz, George C
AU - Hong, Seunghun
PY - 2006
Y1 - 2006
N2 - We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a "double-molecular-layer" model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature.
AB - We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a "double-molecular-layer" model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature.
UR - http://www.scopus.com/inward/record.url?scp=33745130110&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33745130110&partnerID=8YFLogxK
U2 - 10.1063/1.2147139
DO - 10.1063/1.2147139
M3 - Article
C2 - 16422633
AN - SCOPUS:33745130110
VL - 124
JO - Journal of Chemical Physics
JF - Journal of Chemical Physics
SN - 0021-9606
IS - 2
M1 - 024714
ER -