Abstract
We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a "double-molecular-layer" model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature.
| Original language | English |
|---|---|
| Article number | 024714 |
| Journal | Journal of Chemical Physics |
| Volume | 124 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - Jan 23 2006 |
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Physical and Theoretical Chemistry
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Cho, N., Ryu, S., Kim, B., Schatz, G. C., & Hong, S. (2006). Phase of molecular ink in nanoscale direct deposition processes. Journal of Chemical Physics, 124(2), [024714]. https://doi.org/10.1063/1.2147139