Phase of molecular ink in nanoscale direct deposition processes

Narae Cho; Seol Ryu; Byeongju Kim; George C. Schatz; Seunghun Hong

doi:10.1063/1.2147139

Phase of molecular ink in nanoscale direct deposition processes

Narae Cho, Seol Ryu, Byeongju Kim, George C. Schatz, Seunghun Hong

Northwestern University

Research output: Contribution to journal › Article › peer-review

31 Citations (Scopus)

Abstract

We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a "double-molecular-layer" model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature.

Original language	English
Article number	024714
Journal	Journal of Chemical Physics
Volume	124
Issue number	2
DOIs	https://doi.org/10.1063/1.2147139
Publication status	Published - 2006

ASJC Scopus subject areas

Physics and Astronomy(all)
Physical and Theoretical Chemistry

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abstract = "We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a {"}double-molecular-layer{"} model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature.",

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note = "Funding Information: This project is supported by the Korean Ministry of Science and Technology under the NRL grant. One of the authors (S.H.) acknowledges the partial support from Korean Research Foundation (Grant No. KRF-2004-042-C00063). Two of the authors (S.R. and G.C.S.) were supported by AFOSR MURI Grant No. F49620-00-1-0283 and by the National Science Foundation (MRSEC). ",

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AU - Cho, Narae

AU - Ryu, Seol

AU - Kim, Byeongju

AU - Schatz, George C.

AU - Hong, Seunghun

N1 - Funding Information: This project is supported by the Korean Ministry of Science and Technology under the NRL grant. One of the authors (S.H.) acknowledges the partial support from Korean Research Foundation (Grant No. KRF-2004-042-C00063). Two of the authors (S.R. and G.C.S.) were supported by AFOSR MURI Grant No. F49620-00-1-0283 and by the National Science Foundation (MRSEC).

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AB - We report the first observation of a phase transition in a nanoscale direct deposition process. This transition involves the melting of molecular ink layers in dip-pen nanolithography, and it is observed by measuring the temperature dependence of the growth rate of the deposited pattern. The results are interpreted using a diffusion equation approach in conjunction with a "double-molecular-layer" model of the adsorbed molecules on the atomic force microscope tip. The theory provides a qualitative explanation for the dependence of the pattern growth rate on solvent and adsorbed water as well as on temperature.

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