Photochemistry in CH3I adlayers on TiO2(110) studied with postirradiation thermal desorption

Seong Han Kim, Peter C Stair, Eric Weitz

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

The reaction dynamics of photofragments produced by UV photolysis of neat CH3I films, adsorbed on defect-free TiO2(110), have been investigated using postirradiation temperature programmed desorption (PITPD). At low fluences, the film structure remains frozen, retaining photofragments and reaction products in the film. CH4, C2H6, I2, CH2I2, and C2H5I are detected in PITPD. CH4 is a product of translationally hot methyl radicals reacting with CH3I. Desorption of the CH4 trapped in the CH3I films is limited by diffusion in the films. The I-containing products detected in PITPD come predominantly from reactions of trapped I, CH2I, and CH3 radicals, which occur during the TPD process. The desorption of I-containing products in PITPD follows desorption-limited kinetics on the TiO2(110) surface. For C2H6 detected in PITPD, it is not clear whether the dominant reaction pathway involves hot or cold radicals. Electrons produced in the TiO2 substrate upon UV irradiation do not induce significant dissociation of CH3I adsorbed on the (110) surface and thus do not contribute significantly to fragment reactions.

Original languageEnglish
Pages (from-to)4156-4161
Number of pages6
JournalLangmuir
Volume14
Issue number15
Publication statusPublished - Jul 21 1998

Fingerprint

Thermal desorption
Photochemical reactions
Temperature programmed desorption
photochemical reactions
desorption
Desorption
products
temperature
Photolysis
Reaction products
retaining
Irradiation
reaction products
photolysis
Defects
fluence
Kinetics
Electrons
fragments
dissociation

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Physical and Theoretical Chemistry

Cite this

Photochemistry in CH3I adlayers on TiO2(110) studied with postirradiation thermal desorption. / Kim, Seong Han; Stair, Peter C; Weitz, Eric.

In: Langmuir, Vol. 14, No. 15, 21.07.1998, p. 4156-4161.

Research output: Contribution to journalArticle

Kim, Seong Han ; Stair, Peter C ; Weitz, Eric. / Photochemistry in CH3I adlayers on TiO2(110) studied with postirradiation thermal desorption. In: Langmuir. 1998 ; Vol. 14, No. 15. pp. 4156-4161.
@article{c5c6dcdcb1e84e74851c8a57a0c68d7f,
title = "Photochemistry in CH3I adlayers on TiO2(110) studied with postirradiation thermal desorption",
abstract = "The reaction dynamics of photofragments produced by UV photolysis of neat CH3I films, adsorbed on defect-free TiO2(110), have been investigated using postirradiation temperature programmed desorption (PITPD). At low fluences, the film structure remains frozen, retaining photofragments and reaction products in the film. CH4, C2H6, I2, CH2I2, and C2H5I are detected in PITPD. CH4 is a product of translationally hot methyl radicals reacting with CH3I. Desorption of the CH4 trapped in the CH3I films is limited by diffusion in the films. The I-containing products detected in PITPD come predominantly from reactions of trapped I, CH2I, and CH3 radicals, which occur during the TPD process. The desorption of I-containing products in PITPD follows desorption-limited kinetics on the TiO2(110) surface. For C2H6 detected in PITPD, it is not clear whether the dominant reaction pathway involves hot or cold radicals. Electrons produced in the TiO2 substrate upon UV irradiation do not induce significant dissociation of CH3I adsorbed on the (110) surface and thus do not contribute significantly to fragment reactions.",
author = "Kim, {Seong Han} and Stair, {Peter C} and Eric Weitz",
year = "1998",
month = "7",
day = "21",
language = "English",
volume = "14",
pages = "4156--4161",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
number = "15",

}

TY - JOUR

T1 - Photochemistry in CH3I adlayers on TiO2(110) studied with postirradiation thermal desorption

AU - Kim, Seong Han

AU - Stair, Peter C

AU - Weitz, Eric

PY - 1998/7/21

Y1 - 1998/7/21

N2 - The reaction dynamics of photofragments produced by UV photolysis of neat CH3I films, adsorbed on defect-free TiO2(110), have been investigated using postirradiation temperature programmed desorption (PITPD). At low fluences, the film structure remains frozen, retaining photofragments and reaction products in the film. CH4, C2H6, I2, CH2I2, and C2H5I are detected in PITPD. CH4 is a product of translationally hot methyl radicals reacting with CH3I. Desorption of the CH4 trapped in the CH3I films is limited by diffusion in the films. The I-containing products detected in PITPD come predominantly from reactions of trapped I, CH2I, and CH3 radicals, which occur during the TPD process. The desorption of I-containing products in PITPD follows desorption-limited kinetics on the TiO2(110) surface. For C2H6 detected in PITPD, it is not clear whether the dominant reaction pathway involves hot or cold radicals. Electrons produced in the TiO2 substrate upon UV irradiation do not induce significant dissociation of CH3I adsorbed on the (110) surface and thus do not contribute significantly to fragment reactions.

AB - The reaction dynamics of photofragments produced by UV photolysis of neat CH3I films, adsorbed on defect-free TiO2(110), have been investigated using postirradiation temperature programmed desorption (PITPD). At low fluences, the film structure remains frozen, retaining photofragments and reaction products in the film. CH4, C2H6, I2, CH2I2, and C2H5I are detected in PITPD. CH4 is a product of translationally hot methyl radicals reacting with CH3I. Desorption of the CH4 trapped in the CH3I films is limited by diffusion in the films. The I-containing products detected in PITPD come predominantly from reactions of trapped I, CH2I, and CH3 radicals, which occur during the TPD process. The desorption of I-containing products in PITPD follows desorption-limited kinetics on the TiO2(110) surface. For C2H6 detected in PITPD, it is not clear whether the dominant reaction pathway involves hot or cold radicals. Electrons produced in the TiO2 substrate upon UV irradiation do not induce significant dissociation of CH3I adsorbed on the (110) surface and thus do not contribute significantly to fragment reactions.

UR - http://www.scopus.com/inward/record.url?scp=0032116115&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032116115&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0032116115

VL - 14

SP - 4156

EP - 4161

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 15

ER -