Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers

Tatiana Zubkov, André C B Lucassen, Dalia Freeman, Yishay Feldman, Sidney R. Cohen, Guennadi Evmenenko, Pulak Dutta, Milko van der Boom

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Trimethoxy-[11-(2-nitrobenzyloxy)undecyl]silane (1) and trimethoxy-[17-(2-nitrobenzyloxy)heptadecyl]silane (2) have been used for the covalent assembly of siloxane-based photopatternable monolayers. Exposing the monolayers to UV light (312 ± 10 nm) results in the generation of reactive hydroxyl-terminated monolayers without affecting the film quality. The new monolayers, deprotection chemistry, and the effect of photoinduced headgroup lift-off on the monolayer microstructure have been studied in detail by a full complement of physicochemical techniques, including optical (UV-vis) spectroscopy, ellipsometry, aqueous contact angle (CA) measurements, X-ray photoelectron spectroscopy (XPS), synchrotron X-ray reflectivity (XRR), and atomic force microscopy (AFM and AFM-force spectroscopy). AFM-force spectroscopy was used to analyze hydrogen-bond interactions as a function of the nature of the solid-liquid interface. AFM-force spectroscopy indicates a hydrogen-bond energy for photodeprotected monolayers of 8.2 kJ mol -1 (∼2 kcal mol -1). Scanning electron microscopy (SEM) revealed that treatment of photopatterned monolayers with ZnEt 2 solutions resulted in well-defined ∼2 μm × 2 μm features of 10 Å thick ZnO layers.

Original languageEnglish
Pages (from-to)14144-14153
Number of pages10
JournalJournal of Physical Chemistry B
Volume109
Issue number29
DOIs
Publication statusPublished - Jul 28 2005

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Siloxanes
siloxanes
Hydroxyl Radical
Monolayers
atomic force microscopy
silanes
Silanes
spectroscopy
Spectroscopy
hydrogen bonds
Hydrogen bonds
liquid-solid interfaces
complement
ellipsometry
synchrotrons
x rays
Ellipsometry
assembly
Angle measurement
photoelectron spectroscopy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry

Cite this

Zubkov, T., Lucassen, A. C. B., Freeman, D., Feldman, Y., Cohen, S. R., Evmenenko, G., ... van der Boom, M. (2005). Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. Journal of Physical Chemistry B, 109(29), 14144-14153. https://doi.org/10.1021/jp0517854

Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. / Zubkov, Tatiana; Lucassen, André C B; Freeman, Dalia; Feldman, Yishay; Cohen, Sidney R.; Evmenenko, Guennadi; Dutta, Pulak; van der Boom, Milko.

In: Journal of Physical Chemistry B, Vol. 109, No. 29, 28.07.2005, p. 14144-14153.

Research output: Contribution to journalArticle

Zubkov, T, Lucassen, ACB, Freeman, D, Feldman, Y, Cohen, SR, Evmenenko, G, Dutta, P & van der Boom, M 2005, 'Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers', Journal of Physical Chemistry B, vol. 109, no. 29, pp. 14144-14153. https://doi.org/10.1021/jp0517854
Zubkov T, Lucassen ACB, Freeman D, Feldman Y, Cohen SR, Evmenenko G et al. Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. Journal of Physical Chemistry B. 2005 Jul 28;109(29):14144-14153. https://doi.org/10.1021/jp0517854
Zubkov, Tatiana ; Lucassen, André C B ; Freeman, Dalia ; Feldman, Yishay ; Cohen, Sidney R. ; Evmenenko, Guennadi ; Dutta, Pulak ; van der Boom, Milko. / Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. In: Journal of Physical Chemistry B. 2005 ; Vol. 109, No. 29. pp. 14144-14153.
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