Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu, Jason R. Babcock, Melissa A. Lane, John A. Belot, Andrew W. Ott, Matthew V. Metz, Carl R. Kannewurf, Robert P. H. Chang, Tobin J Marks

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)
Original languageEnglish
Pages (from-to)25-28
Number of pages4
JournalChemical Vapor Deposition
Issue number1
Publication statusPublished - Jan 2001

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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