Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu, Jason R. Babcock, Melissa A. Lane, John A. Belot, Andrew W. Ott, Matthew V. Metz, Carl R. Kannewurf, Robert P. H. Chang, Tobin J Marks

Research output: Contribution to journalArticle

15 Citations (Scopus)
Original languageEnglish
Pages (from-to)25-28
Number of pages4
JournalChemical Vapor Deposition
Volume7
Issue number1
DOIs
Publication statusPublished - Jan 2001

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Superconducting films
Metallorganic chemical vapor deposition
Plasmas

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors. / Liu, Xiang; Babcock, Jason R.; Lane, Melissa A.; Belot, John A.; Ott, Andrew W.; Metz, Matthew V.; Kannewurf, Carl R.; Chang, Robert P. H.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 7, No. 1, 01.2001, p. 25-28.

Research output: Contribution to journalArticle

Liu, Xiang ; Babcock, Jason R. ; Lane, Melissa A. ; Belot, John A. ; Ott, Andrew W. ; Metz, Matthew V. ; Kannewurf, Carl R. ; Chang, Robert P. H. ; Marks, Tobin J. / Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors. In: Chemical Vapor Deposition. 2001 ; Vol. 7, No. 1. pp. 25-28.
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