Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu; Jason R. Babcock; Melissa A. Lane; John A. Belot; Andrew W. Ott; Matthew V. Metz; Carl R. Kannewurf; Robert P. H. Chang; Tobin J Marks

doi:10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O

Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors

Xiang Liu, Jason R. Babcock, Melissa A. Lane, John A. Belot, Andrew W. Ott, Matthew V. Metz, Carl R. Kannewurf, Robert P. H. Chang, Tobin J Marks

Northwestern University

Research output: Contribution to journal › Article

15 Citations (Scopus)

Original language	English
Pages (from-to)	25-28
Number of pages	4
Journal	Chemical Vapor Deposition
Volume	7
Issue number	1
DOIs	https://doi.org/10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O
Publication status	Published - Jan 2001

ASJC Scopus subject areas

Process Chemistry and Technology
Electrochemistry
Electronic, Optical and Magnetic Materials
Surfaces, Coatings and Films
Condensed Matter Physics
Surfaces and Interfaces

Access to Document

10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O

Cite this

Liu, X., Babcock, J. R., Lane, M. A., Belot, J. A., Ott, A. W., Metz, M. V., Kannewurf, C. R., Chang, R. P. H., & Marks, T. J. (2001). Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors. Chemical Vapor Deposition, 7(1), 25-28. https://doi.org/10.1002/1521-3862(200101)7:1<25::AID-CVDE25>3.0.CO;2-O

Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors. / Liu, Xiang; Babcock, Jason R.; Lane, Melissa A.; Belot, John A.; Ott, Andrew W.; Metz, Matthew V.; Kannewurf, Carl R.; Chang, Robert P. H.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 7, No. 1, 01.2001, p. 25-28.

Research output: Contribution to journal › Article

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