Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes

M. S. Bell, R. G. Lacerda, K. B.K. Teo, N. L. Rupesinghe, G. A.J. Amaratunga, W. I. Milne, M. Chhowalla

Research output: Contribution to journalArticle

52 Citations (Scopus)

Abstract

In situ measurement of the plasma used for plasma enhanced chemical vapor deposition (PECVD) growth of carbon nanotubes (CNT) was presented. Neutral species and positive ions extracted from a C 2H 2:NH 3 plasma which were used to grow vertically aligned CNT were anslyzed using mass spectrometry. It was found that NH 3 suppressed C 2H 2 decomposition and encouraged CNT formation. It was demonstrated that the removal of excess carbon, essential for obtaining nanotubes without amorphous carbon deposits, was achieved through gas phase reactions which mainly formed HCN.

Original languageEnglish
Pages (from-to)1137-1139
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number7
DOIs
Publication statusPublished - Aug 16 2004

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes'. Together they form a unique fingerprint.

  • Cite this

    Bell, M. S., Lacerda, R. G., Teo, K. B. K., Rupesinghe, N. L., Amaratunga, G. A. J., Milne, W. I., & Chhowalla, M. (2004). Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters, 85(7), 1137-1139. https://doi.org/10.1063/1.1782256