Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes

M. S. Bell, R. G. Lacerda, K. B K Teo, N. L. Rupesinghe, G. A J Amaratunga, W. I. Milne, Manish Chhowalla

Research output: Contribution to journalArticle

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Abstract

In situ measurement of the plasma used for plasma enhanced chemical vapor deposition (PECVD) growth of carbon nanotubes (CNT) was presented. Neutral species and positive ions extracted from a C 2H 2:NH 3 plasma which were used to grow vertically aligned CNT were anslyzed using mass spectrometry. It was found that NH 3 suppressed C 2H 2 decomposition and encouraged CNT formation. It was demonstrated that the removal of excess carbon, essential for obtaining nanotubes without amorphous carbon deposits, was achieved through gas phase reactions which mainly formed HCN.

Original languageEnglish
Pages (from-to)1137-1139
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number7
DOIs
Publication statusPublished - Aug 16 2004

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plasma composition
carbon nanotubes
vapor deposition
carbon
in situ measurement
positive ions
nanotubes
mass spectroscopy
deposits
vapor phases
decomposition
ions

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Bell, M. S., Lacerda, R. G., Teo, K. B. K., Rupesinghe, N. L., Amaratunga, G. A. J., Milne, W. I., & Chhowalla, M. (2004). Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters, 85(7), 1137-1139. https://doi.org/10.1063/1.1782256

Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. / Bell, M. S.; Lacerda, R. G.; Teo, K. B K; Rupesinghe, N. L.; Amaratunga, G. A J; Milne, W. I.; Chhowalla, Manish.

In: Applied Physics Letters, Vol. 85, No. 7, 16.08.2004, p. 1137-1139.

Research output: Contribution to journalArticle

Bell, MS, Lacerda, RG, Teo, KBK, Rupesinghe, NL, Amaratunga, GAJ, Milne, WI & Chhowalla, M 2004, 'Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes', Applied Physics Letters, vol. 85, no. 7, pp. 1137-1139. https://doi.org/10.1063/1.1782256
Bell MS, Lacerda RG, Teo KBK, Rupesinghe NL, Amaratunga GAJ, Milne WI et al. Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters. 2004 Aug 16;85(7):1137-1139. https://doi.org/10.1063/1.1782256
Bell, M. S. ; Lacerda, R. G. ; Teo, K. B K ; Rupesinghe, N. L. ; Amaratunga, G. A J ; Milne, W. I. ; Chhowalla, Manish. / Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. In: Applied Physics Letters. 2004 ; Vol. 85, No. 7. pp. 1137-1139.
@article{8e278b3c6dc7416e9d045ef13221d6da,
title = "Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes",
abstract = "In situ measurement of the plasma used for plasma enhanced chemical vapor deposition (PECVD) growth of carbon nanotubes (CNT) was presented. Neutral species and positive ions extracted from a C 2H 2:NH 3 plasma which were used to grow vertically aligned CNT were anslyzed using mass spectrometry. It was found that NH 3 suppressed C 2H 2 decomposition and encouraged CNT formation. It was demonstrated that the removal of excess carbon, essential for obtaining nanotubes without amorphous carbon deposits, was achieved through gas phase reactions which mainly formed HCN.",
author = "Bell, {M. S.} and Lacerda, {R. G.} and Teo, {K. B K} and Rupesinghe, {N. L.} and Amaratunga, {G. A J} and Milne, {W. I.} and Manish Chhowalla",
year = "2004",
month = "8",
day = "16",
doi = "10.1063/1.1782256",
language = "English",
volume = "85",
pages = "1137--1139",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "7",

}

TY - JOUR

T1 - Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes

AU - Bell, M. S.

AU - Lacerda, R. G.

AU - Teo, K. B K

AU - Rupesinghe, N. L.

AU - Amaratunga, G. A J

AU - Milne, W. I.

AU - Chhowalla, Manish

PY - 2004/8/16

Y1 - 2004/8/16

N2 - In situ measurement of the plasma used for plasma enhanced chemical vapor deposition (PECVD) growth of carbon nanotubes (CNT) was presented. Neutral species and positive ions extracted from a C 2H 2:NH 3 plasma which were used to grow vertically aligned CNT were anslyzed using mass spectrometry. It was found that NH 3 suppressed C 2H 2 decomposition and encouraged CNT formation. It was demonstrated that the removal of excess carbon, essential for obtaining nanotubes without amorphous carbon deposits, was achieved through gas phase reactions which mainly formed HCN.

AB - In situ measurement of the plasma used for plasma enhanced chemical vapor deposition (PECVD) growth of carbon nanotubes (CNT) was presented. Neutral species and positive ions extracted from a C 2H 2:NH 3 plasma which were used to grow vertically aligned CNT were anslyzed using mass spectrometry. It was found that NH 3 suppressed C 2H 2 decomposition and encouraged CNT formation. It was demonstrated that the removal of excess carbon, essential for obtaining nanotubes without amorphous carbon deposits, was achieved through gas phase reactions which mainly formed HCN.

UR - http://www.scopus.com/inward/record.url?scp=4444303476&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4444303476&partnerID=8YFLogxK

U2 - 10.1063/1.1782256

DO - 10.1063/1.1782256

M3 - Article

VL - 85

SP - 1137

EP - 1139

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 7

ER -