Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes

M. S. Bell; R. G. Lacerda; K. B.K. Teo; N. L. Rupesinghe; G. A.J. Amaratunga; W. I. Milne; M. Chhowalla

doi:10.1063/1.1782256

Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes

M. S. Bell, R. G. Lacerda, K. B.K. Teo, N. L. Rupesinghe, G. A.J. Amaratunga, W. I. Milne, M. Chhowalla

Rutgers University

Research output: Contribution to journal › Article

52 Citations (Scopus)

Abstract

In situ measurement of the plasma used for plasma enhanced chemical vapor deposition (PECVD) growth of carbon nanotubes (CNT) was presented. Neutral species and positive ions extracted from a C ₂H ₂:NH ₃ plasma which were used to grow vertically aligned CNT were anslyzed using mass spectrometry. It was found that NH ₃ suppressed C ₂H ₂ decomposition and encouraged CNT formation. It was demonstrated that the removal of excess carbon, essential for obtaining nanotubes without amorphous carbon deposits, was achieved through gas phase reactions which mainly formed HCN.

Original language	English
Pages (from-to)	1137-1139
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	7
DOIs	https://doi.org/10.1063/1.1782256
Publication status	Published - Aug 16 2004

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ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Cite this

Bell, M. S., Lacerda, R. G., Teo, K. B. K., Rupesinghe, N. L., Amaratunga, G. A. J., Milne, W. I., & Chhowalla, M. (2004). Plasma composition during plasma-enhanced chemical vapor deposition of carbon nanotubes. Applied Physics Letters, 85(7), 1137-1139. https://doi.org/10.1063/1.1782256

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AU - Amaratunga, G. A.J.

AU - Milne, W. I.

AU - Chhowalla, M.

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10.1063/1.1782256