Plasma enhanced chemical vapour deposited carbon nanotubes for field emission applications

K. B K Teo, G. Pirio, S. B. Lee, Manish Chhowalla, P. Legagneux, Y. Nedellec, D. G. Hasko, H. Ahmed, D. Pribat, G. A J Amaratunga, W. I. Milne

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Plasma Enhanced Chemical Vapour Deposition is an extremely versatile technique for directly growing multiwalled carbon nanotubes onto various substrates. We will demonstrate the deposition of vertically aligned nanotube arrays, sparsely or densely populated nanotube forests, and precisely patterned arrays of nanotubes. The high-aspect ratio nanotubes (∼50 nm in diameter and 5 microns long) produced are metallic in nature and direct contact electrical measurements reveal that each nanotube has a current carrying capacity of 107-108 A/cm2, making them excellent candidates as field emission sources. We examined the field emission characteristics of dense nanotube forests as well as sparse nanotube forests and found that the sparse forests had significantly lower turn-on fields and higher emission currents. This is due to a reduction in the field enhancement of the nanotubes due to electric field shielding from adjacent nanotubes in the dense nanotube arrays. We thus fabricated a uniform array of single nanotubes to attempt to overcome these issues and will present the field emission characteristics of this.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium - Proceedings
Pages131-136
Number of pages6
Volume706
Publication statusPublished - 2002
EventMaking Functional Materials with Nanotubes - Boston, MA, United States
Duration: Nov 26 2001Nov 29 2001

Other

OtherMaking Functional Materials with Nanotubes
CountryUnited States
CityBoston, MA
Period11/26/0111/29/01

Fingerprint

Carbon Nanotubes
Field emission
Nanotubes
Carbon nanotubes
Vapors
Plasmas
Multiwalled carbon nanotubes (MWCN)
Plasma enhanced chemical vapor deposition
Shielding
Aspect ratio
Electric fields

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Teo, K. B. K., Pirio, G., Lee, S. B., Chhowalla, M., Legagneux, P., Nedellec, Y., ... Milne, W. I. (2002). Plasma enhanced chemical vapour deposited carbon nanotubes for field emission applications. In Materials Research Society Symposium - Proceedings (Vol. 706, pp. 131-136)

Plasma enhanced chemical vapour deposited carbon nanotubes for field emission applications. / Teo, K. B K; Pirio, G.; Lee, S. B.; Chhowalla, Manish; Legagneux, P.; Nedellec, Y.; Hasko, D. G.; Ahmed, H.; Pribat, D.; Amaratunga, G. A J; Milne, W. I.

Materials Research Society Symposium - Proceedings. Vol. 706 2002. p. 131-136.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Teo, KBK, Pirio, G, Lee, SB, Chhowalla, M, Legagneux, P, Nedellec, Y, Hasko, DG, Ahmed, H, Pribat, D, Amaratunga, GAJ & Milne, WI 2002, Plasma enhanced chemical vapour deposited carbon nanotubes for field emission applications. in Materials Research Society Symposium - Proceedings. vol. 706, pp. 131-136, Making Functional Materials with Nanotubes, Boston, MA, United States, 11/26/01.
Teo KBK, Pirio G, Lee SB, Chhowalla M, Legagneux P, Nedellec Y et al. Plasma enhanced chemical vapour deposited carbon nanotubes for field emission applications. In Materials Research Society Symposium - Proceedings. Vol. 706. 2002. p. 131-136
Teo, K. B K ; Pirio, G. ; Lee, S. B. ; Chhowalla, Manish ; Legagneux, P. ; Nedellec, Y. ; Hasko, D. G. ; Ahmed, H. ; Pribat, D. ; Amaratunga, G. A J ; Milne, W. I. / Plasma enhanced chemical vapour deposited carbon nanotubes for field emission applications. Materials Research Society Symposium - Proceedings. Vol. 706 2002. pp. 131-136
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