Plasma enhanced chemical vapour deposited carbon nanotubes for field emission applications

K. B.K. Teo, G. Pirio, S. B. Lee, M. Chhowalla, P. Legagneux, Y. Nedellec, D. G. Hasko, H. Ahmed, D. Pribat, G. A.J. Amaratunga, W. I. Milne

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


Plasma Enhanced Chemical Vapour Deposition is an extremely versatile technique for directly growing multiwalled carbon nanotubes onto various substrates. We will demonstrate the deposition of vertically aligned nanotube arrays, sparsely or densely populated nanotube forests, and precisely patterned arrays of nanotubes. The high-aspect ratio nanotubes (∼50 nm in diameter and 5 microns long) produced are metallic in nature and direct contact electrical measurements reveal that each nanotube has a current carrying capacity of 107-108 A/cm2, making them excellent candidates as field emission sources. We examined the field emission characteristics of dense nanotube forests as well as sparse nanotube forests and found that the sparse forests had significantly lower turn-on fields and higher emission currents. This is due to a reduction in the field enhancement of the nanotubes due to electric field shielding from adjacent nanotubes in the dense nanotube arrays. We thus fabricated a uniform array of single nanotubes to attempt to overcome these issues and will present the field emission characteristics of this.

Original languageEnglish
Pages (from-to)131-136
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - Jan 1 2002

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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