Plasma enhanced chemical vapour deposition carbon nanotubes/nanofibres - How uniform do they grow?

K. B.K. Teo, S. B. Lee, M. Chhowalla, V. Semet, Vu Thien Binh, O. Groening, M. Castignolles, A. Loiseau, G. Pirio, P. Legagneux, D. Pribat, D. G. Hasko, H. Ahmed, G. A.J. Amaratunga, W. I. Milne

Research output: Contribution to journalArticlepeer-review

216 Citations (Scopus)


The ability to grow carbon nanotubes/nanofibres (CNs) with a high degree of uniformity is desirable in many applications. In this paper, the structural uniformity of CNs produced by plasma enhanced chemical vapour deposition is evaluated for field emission applications. When single isolated CNs were deposited using this technology, the structures exhibited remarkable uniformity in terms of diameter and height (standard deviations were 4.1 and 6.3% respectively of the average diameter and height). The lithographic conditions to achieve a high yield of single CNs are also discussed. Using the height and diameter uniformity statistics, we show that it is indeed possible to accurately predict the average field enhancement factor and the distribution of enhancement factors of the structures, which was confirmed by electrical emission measurements on individual CNs in an array.

Original languageEnglish
Pages (from-to)204-211
Number of pages8
Issue number2
Publication statusPublished - Feb 2003

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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