Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography

Erin M. Hicks, Xiaoyu Zhang, Shengli Zou, Olga Lyandres, Kenneth G. Spears, George C Schatz, Richard P. Van Duyne

Research output: Contribution to journalArticle

134 Citations (Scopus)

Abstract

In this work, a detailed and systematic study of the plasmonic properties of a novel film over nanowell surface is investigated. These nanostructures are fabricated using nanosphere lithography and reactive ion etching and structurally characterized by AFM and SEM. The resulting structures show remarkably narrow plasmon bands in reflectance spectra (as little as 0.10 eV) and greater sensitivity to external dielectric environment than has been seen in other nanoparticle systems, resulting in an improvement in the figure of merit (FOM = refractive index sensitivity (eV·RIU -1)/full width at half-maximum (eV)) for refractive index sensing. Theoretical modeling for the plasmon spectra of these nanostructures is done using discrete dipole approximation code under periodic boundary conditions. The modeling results match the measurements accurately in aspects of the variation of the plasmon line shape with altering internanowell distance and dielectric environment.

Original languageEnglish
Pages (from-to)22351-22358
Number of pages8
JournalJournal of Physical Chemistry B
Volume109
Issue number47
DOIs
Publication statusPublished - Dec 1 2005

Fingerprint

Nanospheres
Lithography
Nanostructures
Refractive index
lithography
refractivity
sensitivity
Reactive ion etching
Full width at half maximum
figure of merit
line shape
etching
Boundary conditions
atomic force microscopy
boundary conditions
dipoles
Nanoparticles
reflectance
nanoparticles
Scanning electron microscopy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry

Cite this

Hicks, E. M., Zhang, X., Zou, S., Lyandres, O., Spears, K. G., Schatz, G. C., & Van Duyne, R. P. (2005). Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography. Journal of Physical Chemistry B, 109(47), 22351-22358. https://doi.org/10.1021/jp0545400

Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography. / Hicks, Erin M.; Zhang, Xiaoyu; Zou, Shengli; Lyandres, Olga; Spears, Kenneth G.; Schatz, George C; Van Duyne, Richard P.

In: Journal of Physical Chemistry B, Vol. 109, No. 47, 01.12.2005, p. 22351-22358.

Research output: Contribution to journalArticle

Hicks, EM, Zhang, X, Zou, S, Lyandres, O, Spears, KG, Schatz, GC & Van Duyne, RP 2005, 'Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography', Journal of Physical Chemistry B, vol. 109, no. 47, pp. 22351-22358. https://doi.org/10.1021/jp0545400
Hicks, Erin M. ; Zhang, Xiaoyu ; Zou, Shengli ; Lyandres, Olga ; Spears, Kenneth G. ; Schatz, George C ; Van Duyne, Richard P. / Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography. In: Journal of Physical Chemistry B. 2005 ; Vol. 109, No. 47. pp. 22351-22358.
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