Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

J. R. Babcock, D. D. Benson, A. Wang, N. L. Edleman, J. A. Belot, M. V. Metz, Tobin J Marks

Research output: Contribution to journalArticle


The synthesis, characterization, and solid-state structure of a superior new monomeric Mg metal-organic chemical vapor deposition (MOCVD) precursor, Mg(dpm)2TMEDA is reported. The complex is prepared using commercially available reagents via a simple aqueous route under ambient laboratory conditions. Clean and complete volatilization with no loss of coordinated ligands is observed by thermogravimetric analysis (TGA) at a lower temperature than the commonly used Mg precursor, [Mg(dpm)2]2. High-quality epitaxial films of (100) and (110) MgO are grown using MOCVD on (100) and (110) SrTiO3 using this precursor.

Original languageEnglish
Pages (from-to)180-183
Number of pages4
JournalAdvanced Materials
Issue number15
Publication statusPublished - Aug 2000


ASJC Scopus subject areas

  • Materials Science(all)

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