Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

J. R. Babcock, D. D. Benson, A. Wang, N. L. Edleman, J. A. Belot, M. V. Metz, Tobin J Marks

Research output: Contribution to journalArticle

Abstract

The synthesis, characterization, and solid-state structure of a superior new monomeric Mg metal-organic chemical vapor deposition (MOCVD) precursor, Mg(dpm)2TMEDA is reported. The complex is prepared using commercially available reagents via a simple aqueous route under ambient laboratory conditions. Clean and complete volatilization with no loss of coordinated ligands is observed by thermogravimetric analysis (TGA) at a lower temperature than the commonly used Mg precursor, [Mg(dpm)2]2. High-quality epitaxial films of (100) and (110) MgO are grown using MOCVD on (100) and (110) SrTiO3 using this precursor.

Original languageEnglish
Pages (from-to)180-183
Number of pages4
JournalAdvanced Materials
Volume12
Issue number15
Publication statusPublished - Aug 2000

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Organic Chemicals
Epitaxial films
Organic chemicals
Film growth
Magnesium
Amines
Chemical vapor deposition
Metals
Ligands
Thin films
Metallorganic chemical vapor deposition
Air
Vaporization
Thermogravimetric analysis
Temperature
strontium titanium oxide

ASJC Scopus subject areas

  • Materials Science(all)

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Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. / Babcock, J. R.; Benson, D. D.; Wang, A.; Edleman, N. L.; Belot, J. A.; Metz, M. V.; Marks, Tobin J.

In: Advanced Materials, Vol. 12, No. 15, 08.2000, p. 180-183.

Research output: Contribution to journalArticle

Babcock, J. R. ; Benson, D. D. ; Wang, A. ; Edleman, N. L. ; Belot, J. A. ; Metz, M. V. ; Marks, Tobin J. / Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. In: Advanced Materials. 2000 ; Vol. 12, No. 15. pp. 180-183.
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AU - Marks, Tobin J

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