Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

Jason R. Babcock; Douglas D. Benson; Anchuan Wang; Nikki L. Edleman; John A. Belot; Matthew V. Metz; Tobin J. Marks

doi:10.1002/1521-3862(200008)6:4<180::AID-CVDE180>3.0.CO;2-5

Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

Jason R. Babcock, Douglas D. Benson, Anchuan Wang, Nikki L. Edleman, John A. Belot, Matthew V. Metz, Tobin J. Marks

Northwestern University

Research output: Contribution to journal › Article › peer-review

28 Citations (Scopus)

Original language	English
Pages (from-to)	180-183
Number of pages	4
Journal	Chemical Vapor Deposition
Volume	6
Issue number	4
DOIs	https://doi.org/10.1002/1521-3862(200008)6:4<180::AID-CVDE180>3.0.CO;2-5
Publication status	Published - Aug 2000

ASJC Scopus subject areas

Chemistry(all)
Surfaces and Interfaces
Process Chemistry and Technology

Access to Document

10.1002/1521-3862(200008)6:4<180::AID-CVDE180>3.0.CO;2-5

Cite this

Babcock, J. R., Benson, D. D., Wang, A., Edleman, N. L., Belot, J. A., Metz, M. V., & Marks, T. J. (2000). Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. Chemical Vapor Deposition, 6(4), 180-183. https://doi.org/10.1002/1521-3862(200008)6:4<180::AID-CVDE180>3.0.CO;2-5

Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. / Babcock, Jason R.; Benson, Douglas D.; Wang, Anchuan; Edleman, Nikki L.; Belot, John A.; Metz, Matthew V.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 6, No. 4, 08.2000, p. 180-183.

Research output: Contribution to journal › Article › peer-review

Babcock, JR, Benson, DD, Wang, A, Edleman, NL, Belot, JA, Metz, MV & Marks, TJ 2000, 'Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor', Chemical Vapor Deposition, vol. 6, no. 4, pp. 180-183. https://doi.org/10.1002/1521-3862(200008)6:4<180::AID-CVDE180>3.0.CO;2-5

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