| Original language | English |
|---|---|
| Pages (from-to) | 180-183 |
| Number of pages | 4 |
| Journal | Chemical Vapor Deposition |
| Volume | 6 |
| Issue number | 4 |
| Publication status | Published - Aug 2000 |
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ASJC Scopus subject areas
- Process Chemistry and Technology
- Electrochemistry
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
Cite this
Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. / Babcock, Jason R.; Benson, Douglas D.; Wang, Anchuan; Edleman, Nikki L.; Belot, John A.; Metz, Matthew V.; Marks, Tobin J.
In: Chemical Vapor Deposition, Vol. 6, No. 4, 08.2000, p. 180-183.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor
AU - Babcock, Jason R.
AU - Benson, Douglas D.
AU - Wang, Anchuan
AU - Edleman, Nikki L.
AU - Belot, John A.
AU - Metz, Matthew V.
AU - Marks, Tobin J
PY - 2000/8
Y1 - 2000/8
UR - http://www.scopus.com/inward/record.url?scp=0003012244&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0003012244&partnerID=8YFLogxK
M3 - Article
VL - 6
SP - 180
EP - 183
JO - Chemical Vapor Deposition
JF - Chemical Vapor Deposition
SN - 0948-1907
IS - 4
ER -