Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

Jason R. Babcock, Douglas D. Benson, Anchuan Wang, Nikki L. Edleman, John A. Belot, Matthew V. Metz, Tobin J Marks

Research output: Contribution to journalArticle

25 Citations (Scopus)
Original languageEnglish
Pages (from-to)180-183
Number of pages4
JournalChemical Vapor Deposition
Volume6
Issue number4
Publication statusPublished - Aug 2000

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Epitaxial films
Film growth
Magnesium
magnesium
Chemical vapor deposition
Amines
amines
Ligands
vapor deposition
Thin films
ligands
air
thin films
Air

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. / Babcock, Jason R.; Benson, Douglas D.; Wang, Anchuan; Edleman, Nikki L.; Belot, John A.; Metz, Matthew V.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 6, No. 4, 08.2000, p. 180-183.

Research output: Contribution to journalArticle

Babcock, Jason R. ; Benson, Douglas D. ; Wang, Anchuan ; Edleman, Nikki L. ; Belot, John A. ; Metz, Matthew V. ; Marks, Tobin J. / Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. In: Chemical Vapor Deposition. 2000 ; Vol. 6, No. 4. pp. 180-183.
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