| Original language | English |
|---|---|
| Pages (from-to) | 180-183 |
| Number of pages | 4 |
| Journal | Chemical Vapor Deposition |
| Volume | 6 |
| Issue number | 4 |
| Publication status | Published - Aug 2000 |
ASJC Scopus subject areas
- Process Chemistry and Technology
- Electrochemistry
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
Cite this
Babcock, J. R., Benson, D. D., Wang, A., Edleman, N. L., Belot, J. A., Metz, M. V., & Marks, T. J. (2000). Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. Chemical Vapor Deposition, 6(4), 180-183.