Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

Jason R. Babcock; Douglas D. Benson; Anchuan Wang; Nikki L. Edleman; John A. Belot; Matthew V. Metz; Tobin J Marks

Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor

Jason R. Babcock, Douglas D. Benson, Anchuan Wang, Nikki L. Edleman, John A. Belot, Matthew V. Metz, Tobin J Marks

Northwestern University

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	180-183
Number of pages	4
Journal	Chemical Vapor Deposition
Volume	6
Issue number	4
Publication status	Published - Aug 2000

ASJC Scopus subject areas

Process Chemistry and Technology
Electrochemistry
Electronic, Optical and Magnetic Materials
Surfaces, Coatings and Films
Condensed Matter Physics
Surfaces and Interfaces

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Babcock, J. R., Benson, D. D., Wang, A., Edleman, N. L., Belot, J. A., Metz, M. V., & Marks, T. J. (2000). Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. Chemical Vapor Deposition, 6(4), 180-183.

Polydentate amines as CVD precursor ancillary ligands. Epitaxial MgO thin-film growth using a highly volatile, thermally and air-stable magnesium precursor. / Babcock, Jason R.; Benson, Douglas D.; Wang, Anchuan; Edleman, Nikki L.; Belot, John A.; Metz, Matthew V.; Marks, Tobin J.

In: Chemical Vapor Deposition, Vol. 6, No. 4, 08.2000, p. 180-183.

Research output: Contribution to journal › Article

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