POTENTIAL-SELECTIVE DEPOSITION OF COPPER FROM CHLORIDE SOLUTIONS CONTAINING IRON.

Ralph White, James A Trainham, John Newham, Thomas W. Chapman

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

The potential distribution and concentration profiles within the diffusion layer are predicted for given potential differences between the electrode and solution. The cuprous ion, which is formed by the reduction of the complexed cupric ion at the electrode, is stabilized in the chloride solution and can react either at the electrode or with ferric species within the diffusion layer. The assumption is that this fast and irreversible homogeneous reaction generates a reaction plane, whose position is shown in the concentration and potential profiles. In addition, the position of the reaction plane is plotted as a function of the potential difference between the electrode and adjacent solution. Predicted current-potential and current efficiency-potential curves are also reported.

Original languageEnglish
Pages (from-to)669-676
Number of pages8
JournalJournal of the Electrochemical Society
Volume124
Issue number5
Publication statusPublished - May 1977

Fingerprint

Chlorides
Copper
Iron
chlorides
iron
copper
Electrodes
electrodes
Ions
profiles
ions
curves

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

POTENTIAL-SELECTIVE DEPOSITION OF COPPER FROM CHLORIDE SOLUTIONS CONTAINING IRON. / White, Ralph; Trainham, James A; Newham, John; Chapman, Thomas W.

In: Journal of the Electrochemical Society, Vol. 124, No. 5, 05.1977, p. 669-676.

Research output: Contribution to journalArticle

White, Ralph ; Trainham, James A ; Newham, John ; Chapman, Thomas W. / POTENTIAL-SELECTIVE DEPOSITION OF COPPER FROM CHLORIDE SOLUTIONS CONTAINING IRON. In: Journal of the Electrochemical Society. 1977 ; Vol. 124, No. 5. pp. 669-676.
@article{9fa55068936448139104111e36c426c6,
title = "POTENTIAL-SELECTIVE DEPOSITION OF COPPER FROM CHLORIDE SOLUTIONS CONTAINING IRON.",
abstract = "The potential distribution and concentration profiles within the diffusion layer are predicted for given potential differences between the electrode and solution. The cuprous ion, which is formed by the reduction of the complexed cupric ion at the electrode, is stabilized in the chloride solution and can react either at the electrode or with ferric species within the diffusion layer. The assumption is that this fast and irreversible homogeneous reaction generates a reaction plane, whose position is shown in the concentration and potential profiles. In addition, the position of the reaction plane is plotted as a function of the potential difference between the electrode and adjacent solution. Predicted current-potential and current efficiency-potential curves are also reported.",
author = "Ralph White and Trainham, {James A} and John Newham and Chapman, {Thomas W.}",
year = "1977",
month = "5",
language = "English",
volume = "124",
pages = "669--676",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "5",

}

TY - JOUR

T1 - POTENTIAL-SELECTIVE DEPOSITION OF COPPER FROM CHLORIDE SOLUTIONS CONTAINING IRON.

AU - White, Ralph

AU - Trainham, James A

AU - Newham, John

AU - Chapman, Thomas W.

PY - 1977/5

Y1 - 1977/5

N2 - The potential distribution and concentration profiles within the diffusion layer are predicted for given potential differences between the electrode and solution. The cuprous ion, which is formed by the reduction of the complexed cupric ion at the electrode, is stabilized in the chloride solution and can react either at the electrode or with ferric species within the diffusion layer. The assumption is that this fast and irreversible homogeneous reaction generates a reaction plane, whose position is shown in the concentration and potential profiles. In addition, the position of the reaction plane is plotted as a function of the potential difference between the electrode and adjacent solution. Predicted current-potential and current efficiency-potential curves are also reported.

AB - The potential distribution and concentration profiles within the diffusion layer are predicted for given potential differences between the electrode and solution. The cuprous ion, which is formed by the reduction of the complexed cupric ion at the electrode, is stabilized in the chloride solution and can react either at the electrode or with ferric species within the diffusion layer. The assumption is that this fast and irreversible homogeneous reaction generates a reaction plane, whose position is shown in the concentration and potential profiles. In addition, the position of the reaction plane is plotted as a function of the potential difference between the electrode and adjacent solution. Predicted current-potential and current efficiency-potential curves are also reported.

UR - http://www.scopus.com/inward/record.url?scp=0017492689&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0017492689&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0017492689

VL - 124

SP - 669

EP - 676

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 5

ER -