Preferential growth of carbon nanotubes/nanofibers using lithographically patterned catalysts

K. B K Teo, Manish Chhowalla, G. A J Amaratunga, W. I. Milne, G. Pirio, P. Legagneux, F. Wycisk, D. Pribat

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

In order to utilise the full potential of carbon nanotubes/nanofibers, it is necessary to be able to synthesize well aligned nanotubes/nanofibres at desired locations on a substrate. This paper examines the preferential growth of aligned carbon nanofibres by PECVD using lithographically patterned catalysts. In the PECVD deposition process, amorphous carbon is deposited together with the nanotubes due to the plasma decomposition of the carbon feed gas, in this case, acetylene. The challenge is to uniformly nucleate nanotudes and reduce the unwanted amorphous carbon on both the patterned and unpatterned areas. An etching gas (ammonia) is thus also incorporated into the PECVD process and by appropriately balancing the acetylene to ammonia ratio, conditions are obtained where no unwanted amorphous carbon is deposited. In this paper, we demonstrate high yield, uniform, 'clean' and preferential growth of vertically aligned nanotubes using PECVD.

Original languageEnglish
Pages (from-to)W9.1.1-W9.1.6
JournalMaterials Research Society Symposium - Proceedings
Volume675
Publication statusPublished - 2001

Fingerprint

Carbon Nanotubes
Plasma enhanced chemical vapor deposition
Nanofibers
Carbon nanotubes
Amorphous carbon
carbon nanotubes
Nanotubes
catalysts
Acetylene
Catalysts
carbon
nanotubes
Ammonia
acetylene
Gases
ammonia
Carbon nanofibers
Etching
Carbon
gases

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Teo, K. B. K., Chhowalla, M., Amaratunga, G. A. J., Milne, W. I., Pirio, G., Legagneux, P., ... Pribat, D. (2001). Preferential growth of carbon nanotubes/nanofibers using lithographically patterned catalysts. Materials Research Society Symposium - Proceedings, 675, W9.1.1-W9.1.6.

Preferential growth of carbon nanotubes/nanofibers using lithographically patterned catalysts. / Teo, K. B K; Chhowalla, Manish; Amaratunga, G. A J; Milne, W. I.; Pirio, G.; Legagneux, P.; Wycisk, F.; Pribat, D.

In: Materials Research Society Symposium - Proceedings, Vol. 675, 2001, p. W9.1.1-W9.1.6.

Research output: Contribution to journalArticle

Teo, KBK, Chhowalla, M, Amaratunga, GAJ, Milne, WI, Pirio, G, Legagneux, P, Wycisk, F & Pribat, D 2001, 'Preferential growth of carbon nanotubes/nanofibers using lithographically patterned catalysts', Materials Research Society Symposium - Proceedings, vol. 675, pp. W9.1.1-W9.1.6.
Teo, K. B K ; Chhowalla, Manish ; Amaratunga, G. A J ; Milne, W. I. ; Pirio, G. ; Legagneux, P. ; Wycisk, F. ; Pribat, D. / Preferential growth of carbon nanotubes/nanofibers using lithographically patterned catalysts. In: Materials Research Society Symposium - Proceedings. 2001 ; Vol. 675. pp. W9.1.1-W9.1.6.
@article{4fea9b527cb64a1fae9d54f488511ee7,
title = "Preferential growth of carbon nanotubes/nanofibers using lithographically patterned catalysts",
abstract = "In order to utilise the full potential of carbon nanotubes/nanofibers, it is necessary to be able to synthesize well aligned nanotubes/nanofibres at desired locations on a substrate. This paper examines the preferential growth of aligned carbon nanofibres by PECVD using lithographically patterned catalysts. In the PECVD deposition process, amorphous carbon is deposited together with the nanotubes due to the plasma decomposition of the carbon feed gas, in this case, acetylene. The challenge is to uniformly nucleate nanotudes and reduce the unwanted amorphous carbon on both the patterned and unpatterned areas. An etching gas (ammonia) is thus also incorporated into the PECVD process and by appropriately balancing the acetylene to ammonia ratio, conditions are obtained where no unwanted amorphous carbon is deposited. In this paper, we demonstrate high yield, uniform, 'clean' and preferential growth of vertically aligned nanotubes using PECVD.",
author = "Teo, {K. B K} and Manish Chhowalla and Amaratunga, {G. A J} and Milne, {W. I.} and G. Pirio and P. Legagneux and F. Wycisk and D. Pribat",
year = "2001",
language = "English",
volume = "675",
pages = "W9.1.1--W9.1.6",
journal = "Materials Research Society Symposium - Proceedings",
issn = "0272-9172",
publisher = "Materials Research Society",

}

TY - JOUR

T1 - Preferential growth of carbon nanotubes/nanofibers using lithographically patterned catalysts

AU - Teo, K. B K

AU - Chhowalla, Manish

AU - Amaratunga, G. A J

AU - Milne, W. I.

AU - Pirio, G.

AU - Legagneux, P.

AU - Wycisk, F.

AU - Pribat, D.

PY - 2001

Y1 - 2001

N2 - In order to utilise the full potential of carbon nanotubes/nanofibers, it is necessary to be able to synthesize well aligned nanotubes/nanofibres at desired locations on a substrate. This paper examines the preferential growth of aligned carbon nanofibres by PECVD using lithographically patterned catalysts. In the PECVD deposition process, amorphous carbon is deposited together with the nanotubes due to the plasma decomposition of the carbon feed gas, in this case, acetylene. The challenge is to uniformly nucleate nanotudes and reduce the unwanted amorphous carbon on both the patterned and unpatterned areas. An etching gas (ammonia) is thus also incorporated into the PECVD process and by appropriately balancing the acetylene to ammonia ratio, conditions are obtained where no unwanted amorphous carbon is deposited. In this paper, we demonstrate high yield, uniform, 'clean' and preferential growth of vertically aligned nanotubes using PECVD.

AB - In order to utilise the full potential of carbon nanotubes/nanofibers, it is necessary to be able to synthesize well aligned nanotubes/nanofibres at desired locations on a substrate. This paper examines the preferential growth of aligned carbon nanofibres by PECVD using lithographically patterned catalysts. In the PECVD deposition process, amorphous carbon is deposited together with the nanotubes due to the plasma decomposition of the carbon feed gas, in this case, acetylene. The challenge is to uniformly nucleate nanotudes and reduce the unwanted amorphous carbon on both the patterned and unpatterned areas. An etching gas (ammonia) is thus also incorporated into the PECVD process and by appropriately balancing the acetylene to ammonia ratio, conditions are obtained where no unwanted amorphous carbon is deposited. In this paper, we demonstrate high yield, uniform, 'clean' and preferential growth of vertically aligned nanotubes using PECVD.

UR - http://www.scopus.com/inward/record.url?scp=85010767231&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85010767231&partnerID=8YFLogxK

M3 - Article

VL - 675

SP - W9.1.1-W9.1.6

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

SN - 0272-9172

ER -