Probing the structure and chemistry of perylenetetracarboxylic dianhydride on graphene before and after atomic layer deposition of alumina

James E. Johns, Hunter J. Karmel, Justice M P Alaboson, Mark C Hersam

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

The superlative electronic properties of graphene suggest its use as the foundation of next-generation integrated circuits. However, this application requires precise control of the interface between graphene and other materials, especially the metal oxides that are commonly used as gate dielectrics. Toward that end, organic seeding layers have been empirically shown to seed ultrathin dielectric growth on graphene via atomic layer deposition (ALD), although the underlying chemical mechanisms and structural details of the molecule/dielectric interface remain unknown. Here, confocal resonance Raman spectroscopy is employed to quantify the structure and chemistry of monolayers of 3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA) on graphene before and after deposition of alumina with the ALD precursors trimethyl aluminum (TMA) and water. Photoluminescence measurements provide further insight into the details of the growth mechanism, including the transition between layer-by-layer growth and island formation. Overall, these results reveal that PTCDA is not consumed during ALD, thereby preserving a well-defined and passivating organic interface between graphene and deposited dielectric thin films.

Original languageEnglish
Pages (from-to)1974-1979
Number of pages6
JournalJournal of Physical Chemistry Letters
Volume3
Issue number15
DOIs
Publication statusPublished - Aug 2 2012

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Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
Graphene
graphene
Alumina
aluminum oxides
chemistry
Dielectric films
Gate dielectrics
inoculation
Aluminum
Electronic properties
Oxides
preserving
integrated circuits
metal oxides
Integrated circuits
Seed

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Probing the structure and chemistry of perylenetetracarboxylic dianhydride on graphene before and after atomic layer deposition of alumina. / Johns, James E.; Karmel, Hunter J.; Alaboson, Justice M P; Hersam, Mark C.

In: Journal of Physical Chemistry Letters, Vol. 3, No. 15, 02.08.2012, p. 1974-1979.

Research output: Contribution to journalArticle

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