Abstract
In this paper, the extraction of doping profiles in ferroelectric thin-film capacitors using ferroelectric capacitance-voltage (CV) measurements is studied. For a ferroelectric field-dependent permittivity model, the doping profile relation to measured CV curves for ferroelectric thin-film capacitors is found to be analogous to the well-known result of metal-semiconductor Schottky junctions with an easily determined effective dielectric constant. Computer simulation shows the electrical doping concentration of ferroelectric thin-film capacitors can be profiled accurately with the proposed model. Limitations of the model are investigated.
Original language | English |
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Pages (from-to) | 2517-2527 |
Number of pages | 11 |
Journal | Journal of Applied Physics |
Volume | 82 |
Issue number | 5 |
Publication status | Published - Sep 1 1997 |
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Physics and Astronomy (miscellaneous)