Programmable soft lithography: Solvent-assisted nanoscale embossing

Min Hyung Lee, Mark D. Huntington, Wei Zhou, Jiun Chan Yang, Teri W. Odom

Research output: Contribution to journalArticle

84 Citations (Scopus)

Abstract

This paper reports an all-moldable nanofabrication platform that can generate, from a single master, large-area nanoscale patterns with programmable densities, fill factors, and lattice symmetries. Solvent-assisted nanoscale embossing (SANE) could increase the spacing of patterns up to 100% as well as decrease them down to 50% in a single step by stretching or heating a polymer substrate. Also, SANE could reduce critical feature sizes as small as 45% compared to the master by controlled swelling of patterned molds with different solvents. These capabilities were applied to generate plasmonic nanoparticle arrays with continuously variable separations and hence different optical properties on the same substrate.

Original languageEnglish
Pages (from-to)311-315
Number of pages5
JournalNano letters
Volume11
Issue number2
DOIs
Publication statusPublished - Feb 9 2011

Keywords

  • Nanopatterning
  • nanomolding
  • nanoparticle array
  • surface plasmon

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Programmable soft lithography: Solvent-assisted nanoscale embossing'. Together they form a unique fingerprint.

  • Cite this