Programmable soft lithography: Solvent-assisted nanoscale embossing

Min Hyung Lee, Mark D. Huntington, Wei Zhou, Jiun Chan Yang, Teri W Odom

Research output: Contribution to journalArticle

72 Citations (Scopus)

Abstract

This paper reports an all-moldable nanofabrication platform that can generate, from a single master, large-area nanoscale patterns with programmable densities, fill factors, and lattice symmetries. Solvent-assisted nanoscale embossing (SANE) could increase the spacing of patterns up to 100% as well as decrease them down to 50% in a single step by stretching or heating a polymer substrate. Also, SANE could reduce critical feature sizes as small as 45% compared to the master by controlled swelling of patterned molds with different solvents. These capabilities were applied to generate plasmonic nanoparticle arrays with continuously variable separations and hence different optical properties on the same substrate.

Original languageEnglish
Pages (from-to)311-315
Number of pages5
JournalNano Letters
Volume11
Issue number2
DOIs
Publication statusPublished - Feb 9 2011

Fingerprint

embossing
Lithography
lithography
nanofabrication
Molds
Substrates
Nanotechnology
swelling
Stretching
Swelling
Polymers
platforms
Optical properties
spacing
Nanoparticles
Heating
optical properties
nanoparticles
heating
polymers

Keywords

  • nanomolding
  • nanoparticle array
  • Nanopatterning
  • surface plasmon

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanical Engineering

Cite this

Programmable soft lithography : Solvent-assisted nanoscale embossing. / Lee, Min Hyung; Huntington, Mark D.; Zhou, Wei; Yang, Jiun Chan; Odom, Teri W.

In: Nano Letters, Vol. 11, No. 2, 09.02.2011, p. 311-315.

Research output: Contribution to journalArticle

Lee, MH, Huntington, MD, Zhou, W, Yang, JC & Odom, TW 2011, 'Programmable soft lithography: Solvent-assisted nanoscale embossing', Nano Letters, vol. 11, no. 2, pp. 311-315. https://doi.org/10.1021/nl102206x
Lee, Min Hyung ; Huntington, Mark D. ; Zhou, Wei ; Yang, Jiun Chan ; Odom, Teri W. / Programmable soft lithography : Solvent-assisted nanoscale embossing. In: Nano Letters. 2011 ; Vol. 11, No. 2. pp. 311-315.
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