Publisher's Note: "Chemical vapor deposition of monolayer MoS2 directly on ultrathin Al2O3 for low-power electronics" [Appl. Phys. Lett. 110, 053101 (2016)]

Hadallia Bergeron; Vinod K. Sangwan; Julian J. McMorrow; Gavin P. Campbell; Itamar Balla; Xiaolong Liu; Michael J. Bedzyk; Tobin J. Marks; Mark C. Hersam

doi:10.1063/1.4977519

Publisher's Note: "Chemical vapor deposition of monolayer MoS₂ directly on ultrathin Al₂O₃ for low-power electronics" [Appl. Phys. Lett. 110, 053101 (2016)]

Hadallia Bergeron, Vinod K. Sangwan, Julian J. McMorrow, Gavin P. Campbell, Itamar Balla, Xiaolong Liu, Michael J. Bedzyk, Tobin J. Marks, Mark C. Hersam

Northwestern University

Research output: Contribution to journal › Comment/debate › peer-review

10 Citations (Scopus)

Original language	English
Article number	099901
Journal	Applied Physics Letters
Volume	110
Issue number	9
DOIs	https://doi.org/10.1063/1.4977519
Publication status	Published - Feb 27 2017

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Access to Document

10.1063/1.4977519

Cite this

Bergeron, H., Sangwan, V. K., McMorrow, J. J., Campbell, G. P., Balla, I., Liu, X., Bedzyk, M. J., Marks, T. J., & Hersam, M. C. (2017). Publisher's Note: "Chemical vapor deposition of monolayer MoS₂ directly on ultrathin Al₂O₃ for low-power electronics" [Appl. Phys. Lett. 110, 053101 (2016)]. Applied Physics Letters, 110(9), [099901]. https://doi.org/10.1063/1.4977519

Publisher's Note : "Chemical vapor deposition of monolayer MoS₂ directly on ultrathin Al₂O₃ for low-power electronics" [Appl. Phys. Lett. 110, 053101 (2016)]. / Bergeron, Hadallia; Sangwan, Vinod K.; McMorrow, Julian J.; Campbell, Gavin P.; Balla, Itamar; Liu, Xiaolong; Bedzyk, Michael J.; Marks, Tobin J.; Hersam, Mark C.

In: Applied Physics Letters, Vol. 110, No. 9, 099901, 27.02.2017.

Research output: Contribution to journal › Comment/debate › peer-review

Bergeron, Hadallia ; Sangwan, Vinod K. ; McMorrow, Julian J. ; Campbell, Gavin P. ; Balla, Itamar ; Liu, Xiaolong ; Bedzyk, Michael J. ; Marks, Tobin J. ; Hersam, Mark C. / Publisher's Note : "Chemical vapor deposition of monolayer MoS₂ directly on ultrathin Al₂O₃ for low-power electronics" [Appl. Phys. Lett. 110, 053101 (2016)]. In: Applied Physics Letters. 2017 ; Vol. 110, No. 9.

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