Pulsed excimer laser deposition of potassium titanyl phosphate films

Fulin Xiong, Robert P. H. Chang, M. E. Hagerman, V. L. Kozhevnikov, Kenneth R Poeppelmeier, Haitain Zhou, G. K. Wong, J. B. Ketterson, C. W. White

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14 Citations (Scopus)


The deposition of highly oriented KTP thin films by pulsed excimer laser ablation (PELA) is demonstrated. The KTP thin films were fabricated on sapphire substrates, or polycrystalline films on silicon substrates at relatively low substrate temperatures. The preferential crystalline orientation was dependent on the substrate temperature and the oxygen partial pressure. The films showed high SHG response with deff comparable to the bulk value of a KTP crystal.

Original languageEnglish
Pages (from-to)161-163
Number of pages3
JournalApplied Physics Letters
Issue number2
Publication statusPublished - Jan 1994


ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Xiong, F., Chang, R. P. H., Hagerman, M. E., Kozhevnikov, V. L., Poeppelmeier, K. R., Zhou, H., Wong, G. K., Ketterson, J. B., & White, C. W. (1994). Pulsed excimer laser deposition of potassium titanyl phosphate films. Applied Physics Letters, 64(2), 161-163. https://doi.org/10.1063/1.111551