REAL-TIME DIAGNOSIS OF ETCHING AND DEPOSITION PROCESS BY SPECTROSCOPIC ELLIPSOMETRY.

D. E. Aspnes, Robert P. H. Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Recent advances in instrumentation and data analysis have made spectroscopic ellipsometry a routine analytic tool with submonolayer sensitivity for monitoring and controlling cleaning, etching, deposition, or other processes that take place in relatively high-pressure or reactive environments. We discuss representative applications in chemical etching, plasma processing, and MOCVD to illustrate analytical procedures and to indicate other potential uses of the technique.

Original languageEnglish
Title of host publicationMaterials Research Society Symposia Proceedings
EditorsA.Wayne Johnson, Daniel J. Ehrlich, Howard R. Schlossberg
PublisherNorth-Holland
Pages217-224
Number of pages8
Volume29
ISBN (Print)0444008942
Publication statusPublished - 1984

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Plasma applications
Spectroscopic ellipsometry
Metallorganic chemical vapor deposition
Etching
Cleaning
Monitoring

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Aspnes, D. E., & Chang, R. P. H. (1984). REAL-TIME DIAGNOSIS OF ETCHING AND DEPOSITION PROCESS BY SPECTROSCOPIC ELLIPSOMETRY. In A. W. Johnson, D. J. Ehrlich, & H. R. Schlossberg (Eds.), Materials Research Society Symposia Proceedings (Vol. 29, pp. 217-224). North-Holland.

REAL-TIME DIAGNOSIS OF ETCHING AND DEPOSITION PROCESS BY SPECTROSCOPIC ELLIPSOMETRY. / Aspnes, D. E.; Chang, Robert P. H.

Materials Research Society Symposia Proceedings. ed. / A.Wayne Johnson; Daniel J. Ehrlich; Howard R. Schlossberg. Vol. 29 North-Holland, 1984. p. 217-224.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Aspnes, DE & Chang, RPH 1984, REAL-TIME DIAGNOSIS OF ETCHING AND DEPOSITION PROCESS BY SPECTROSCOPIC ELLIPSOMETRY. in AW Johnson, DJ Ehrlich & HR Schlossberg (eds), Materials Research Society Symposia Proceedings. vol. 29, North-Holland, pp. 217-224.
Aspnes DE, Chang RPH. REAL-TIME DIAGNOSIS OF ETCHING AND DEPOSITION PROCESS BY SPECTROSCOPIC ELLIPSOMETRY. In Johnson AW, Ehrlich DJ, Schlossberg HR, editors, Materials Research Society Symposia Proceedings. Vol. 29. North-Holland. 1984. p. 217-224
Aspnes, D. E. ; Chang, Robert P. H. / REAL-TIME DIAGNOSIS OF ETCHING AND DEPOSITION PROCESS BY SPECTROSCOPIC ELLIPSOMETRY. Materials Research Society Symposia Proceedings. editor / A.Wayne Johnson ; Daniel J. Ehrlich ; Howard R. Schlossberg. Vol. 29 North-Holland, 1984. pp. 217-224
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