Recent advances in instrumentation and data analysis have made spectroscopic ellipsometry a routine analytic tool with submonolayer sensitivity for monitoring and controlling cleaning, etching, deposition, or other processes that take place in relatively high-pressure or reactive environments. We discuss representative applications in chemical etching, plasma processing, and MOCVD to illustrate analytical procedures and to indicate other potential uses of the technique.
|Title of host publication||Materials Research Society Symposia Proceedings|
|Editors||A.Wayne Johnson, Daniel J. Ehrlich, Howard R. Schlossberg|
|Number of pages||8|
|Publication status||Published - 1984|
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials