Reduction photolithography using microlens arrays

Applications in gray scale photolithography

Hongkai Wu, Teri W Odom, George M. Whitesides

Research output: Contribution to journalArticle

77 Citations (Scopus)

Abstract

This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of ∼2 × 2 cm2. The simple optical configuration consisted of transparency film (having centimeter-sized features) as gray scale photomasks, an overhead projector as the illumination source, and arrays of microlenses as the size-reducing elements. Arrays of 40- and 100-μm lenses achieved a lateral size reduction of ∼103 and generated patterns of well-defined, multilevel structures; these structures may find use in applications such as diffractive optics.

Original languageEnglish
Pages (from-to)3267-3273
Number of pages7
JournalAnalytical Chemistry
Volume74
Issue number14
DOIs
Publication statusPublished - Jul 15 2002

Fingerprint

Microlenses
Photolithography
Diffractive optics
Photomasks
Photoresists
Transparency
Masks
Lenses
Lighting
Microstructure

ASJC Scopus subject areas

  • Analytical Chemistry

Cite this

Reduction photolithography using microlens arrays : Applications in gray scale photolithography. / Wu, Hongkai; Odom, Teri W; Whitesides, George M.

In: Analytical Chemistry, Vol. 74, No. 14, 15.07.2002, p. 3267-3273.

Research output: Contribution to journalArticle

@article{33cdf9932e574c4289dedf73c8c9c5b2,
title = "Reduction photolithography using microlens arrays: Applications in gray scale photolithography",
abstract = "This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of ∼2 × 2 cm2. The simple optical configuration consisted of transparency film (having centimeter-sized features) as gray scale photomasks, an overhead projector as the illumination source, and arrays of microlenses as the size-reducing elements. Arrays of 40- and 100-μm lenses achieved a lateral size reduction of ∼103 and generated patterns of well-defined, multilevel structures; these structures may find use in applications such as diffractive optics.",
author = "Hongkai Wu and Odom, {Teri W} and Whitesides, {George M.}",
year = "2002",
month = "7",
day = "15",
doi = "10.1021/ac020151f",
language = "English",
volume = "74",
pages = "3267--3273",
journal = "Analytical Chemistry",
issn = "0003-2700",
publisher = "American Chemical Society",
number = "14",

}

TY - JOUR

T1 - Reduction photolithography using microlens arrays

T2 - Applications in gray scale photolithography

AU - Wu, Hongkai

AU - Odom, Teri W

AU - Whitesides, George M.

PY - 2002/7/15

Y1 - 2002/7/15

N2 - This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of ∼2 × 2 cm2. The simple optical configuration consisted of transparency film (having centimeter-sized features) as gray scale photomasks, an overhead projector as the illumination source, and arrays of microlenses as the size-reducing elements. Arrays of 40- and 100-μm lenses achieved a lateral size reduction of ∼103 and generated patterns of well-defined, multilevel structures; these structures may find use in applications such as diffractive optics.

AB - This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of ∼2 × 2 cm2. The simple optical configuration consisted of transparency film (having centimeter-sized features) as gray scale photomasks, an overhead projector as the illumination source, and arrays of microlenses as the size-reducing elements. Arrays of 40- and 100-μm lenses achieved a lateral size reduction of ∼103 and generated patterns of well-defined, multilevel structures; these structures may find use in applications such as diffractive optics.

UR - http://www.scopus.com/inward/record.url?scp=0037099127&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037099127&partnerID=8YFLogxK

U2 - 10.1021/ac020151f

DO - 10.1021/ac020151f

M3 - Article

VL - 74

SP - 3267

EP - 3273

JO - Analytical Chemistry

JF - Analytical Chemistry

SN - 0003-2700

IS - 14

ER -