Reproducible lateral force microscopy measurements for quantitative comparisons of the frictional and chemical properties of nanostructures

M. W. Such, D. E. Kramer, M. C. Hersam

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Atomic force microscopy (AFM) is a widely used technique for characterizing the topography and frictional properties of nanostructures. Inherent misalignments between the AFM cantilever and the feedback hardware lead to crosstalk between topography data and lateral force microscopy (LFM) data. Because the degree of crosstalk depends on the positioning of the cantilever, LFM and topography data of the same structure can vary from one experiment to the next. For nanostructures with large LFM contrast, errors as large as 50% in topography and LFM can be observed. This paper describes an empirical strategy for correcting this alignment error. The technique is used to characterize the frictional properties of scanning probe-induced oxide nanostructures and the hydrogen-terminated Si(111) surfaces on which they are patterned. Reproducible differences in the frictional properties of the oxide nanostructures patterned on HF-treated and NH4F-treated Si(111) surfaces are observed and attributed to the mixed-hydride versus monohydride termination of each surface. The observed frictional contrast is consistent with known differences in surface reactivity and demonstrates how LFM measurements can provide insight into the frictional and chemical properties of nanostructures

Original languageEnglish
Pages (from-to)189-196
Number of pages8
JournalUltramicroscopy
Volume99
Issue number2-3
DOIs
Publication statusPublished - May 2004

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Keywords

  • 07.79.S
  • 18
  • 68.65
  • 81.65.C
  • Lateral force microscopy
  • Nanolithography
  • Oxidation
  • Silicon

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

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