Room temperature molecular resolution nanopatterning of cyclopentene monolayers on Si(100) via feedback controlled lithography

Hunter J. Karmel, Mark C Hersam

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Molecularly precise nanopatterning is demonstrated for a saturated organic monolayer on the Si(100) surface using room temperature ultra-high vacuum scanning tunneling microscopy. In particular, feedback controlled lithography enables the clean desorption of individual molecules from a highly-ordered cyclopentene monolayer at moderate negative sample bias, resulting in the exposure of isolated silicon dimers on an otherwise organically passivated surface. The quality and uniformity of the cyclopentene passivation layer is also quantified with X-ray photoelectron spectroscopy following exposure to ambient conditions, revealing that complete formation of the native oxide on silicon is suppressed for time scales exceeding 100 days.

Original languageEnglish
Article number243106
JournalApplied Physics Letters
Volume102
Issue number24
DOIs
Publication statusPublished - Jun 17 2013

Fingerprint

lithography
silicon
room temperature
ultrahigh vacuum
passivity
surface temperature
scanning tunneling microscopy
desorption
dimers
photoelectron spectroscopy
oxides
molecules
x rays

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Room temperature molecular resolution nanopatterning of cyclopentene monolayers on Si(100) via feedback controlled lithography. / Karmel, Hunter J.; Hersam, Mark C.

In: Applied Physics Letters, Vol. 102, No. 24, 243106, 17.06.2013.

Research output: Contribution to journalArticle

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