Room temperature nanofabrication of atomically registered heteromolecular organosilicon nanostructures using multistep feedback controlled lithography

R. Basu, N. P. Guisinger, M. E. Greene, Mark C Hersam

Research output: Contribution to journalArticle

72 Citations (Scopus)

Abstract

The nanofabrication and characterization of atomically registered heteromolecular organosilicon nanostructures at room temperature were investigated using ultrahigh vaccum scanning tunneling microscopy. The individual 2, 2, 6, 6-tetramethyl1-1-piperidinyloxy (TEMPO) free radical molecules at opposite ends of the same dimer row on the Si(100)-2×1:H surface were patterned using a feedback controlled lithography (FCL). FCL is also applied to remove individual hydrogen atom from the surface with atomic precision. The multistep FCL is also considered as an effective means for fabricating prototype molecular-scale electronic and mechanical devices on Si(100) surface.

Original languageEnglish
Pages (from-to)2619-2621
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number13
DOIs
Publication statusPublished - Sep 27 2004

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nanofabrication
lithography
room temperature
mechanical devices
free radicals
scanning tunneling microscopy
hydrogen atoms
prototypes
dimers
electronics
molecules

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Room temperature nanofabrication of atomically registered heteromolecular organosilicon nanostructures using multistep feedback controlled lithography. / Basu, R.; Guisinger, N. P.; Greene, M. E.; Hersam, Mark C.

In: Applied Physics Letters, Vol. 85, No. 13, 27.09.2004, p. 2619-2621.

Research output: Contribution to journalArticle

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