Rutherford scattering-channeling analysis of semiconductor interfaces

Leonard C Feldman

doi:10.1016/0040-6090(83)90541-2

Rutherford scattering-channeling analysis of semiconductor interfaces

Leonard C Feldman

Rutgers University

Research output: Contribution to journal › Article

2 Citations (Scopus)

Abstract

The main concepts in ion scattering analysis of interfaces are reviewed and relevant literature is cited.

Original language	English
Pages (from-to)	3-6
Number of pages	4
Journal	Thin Solid Films
Volume	104
Issue number	1-2
DOIs	https://doi.org/10.1016/0040-6090(83)90541-2
Publication status	Published - Jun 17 1983

ASJC Scopus subject areas

Surfaces, Coatings and Films
Condensed Matter Physics
Surfaces and Interfaces

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Feldman, L. C. (1983). Rutherford scattering-channeling analysis of semiconductor interfaces. Thin Solid Films, 104(1-2), 3-6. https://doi.org/10.1016/0040-6090(83)90541-2

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