Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

T. Jurca, A. W. Peters, A. R. Mouat, O. K. Farha, Joseph T Hupp, T. L. Lohr, M. Delferro, Tobin J Marks

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

Original languageEnglish
Pages (from-to)1172-1178
Number of pages7
JournalDalton Transactions
Volume46
Issue number4
DOIs
Publication statusPublished - 2017

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Molybdenum
Atomic layer deposition
Quartz crystal microbalances
Film growth
Photoelectrons
Nitrides
X ray diffraction analysis
Thermogravimetric analysis
Nuclear magnetic resonance
Derivatives
X rays
molybdenum trioxide
molybdenum dioxide
actinomycin D2

ASJC Scopus subject areas

  • Inorganic Chemistry

Cite this

Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition. / Jurca, T.; Peters, A. W.; Mouat, A. R.; Farha, O. K.; Hupp, Joseph T; Lohr, T. L.; Delferro, M.; Marks, Tobin J.

In: Dalton Transactions, Vol. 46, No. 4, 2017, p. 1172-1178.

Research output: Contribution to journalArticle

Jurca, T. ; Peters, A. W. ; Mouat, A. R. ; Farha, O. K. ; Hupp, Joseph T ; Lohr, T. L. ; Delferro, M. ; Marks, Tobin J. / Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition. In: Dalton Transactions. 2017 ; Vol. 46, No. 4. pp. 1172-1178.
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AB - The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

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