Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

T. Jurca; A. W. Peters; A. R. Mouat; O. K. Farha; J. T. Hupp; T. L. Lohr; M. Delferro; T. J. Marks

doi:10.1039/c6dt03952a

Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

T. Jurca, A. W. Peters, A. R. Mouat, O. K. Farha, J. T. Hupp, T. L. Lohr, M. Delferro, T. J. Marks

Northwestern University

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

The synthesis of molybdenum oxo-amidinate complexes MoO₂(R₂AMD)₂ [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and ⁱPr (3)], and their characterization by ¹H, ¹³C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO₃ film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O₃ as the second ALD reagent, yields nitride-free MoO₃ films.

Original language	English
Pages (from-to)	1172-1178
Number of pages	7
Journal	Dalton Transactions
Volume	46
Issue number	4
DOIs	https://doi.org/10.1039/c6dt03952a
Publication status	Published - 2017

ASJC Scopus subject areas

Inorganic Chemistry

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10.1039/c6dt03952a

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@article{8360a7ffd5994219aaf372c8c732f0ae,

title = "Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition",

abstract = "The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.",

author = "T. Jurca and Peters, {A. W.} and Mouat, {A. R.} and Farha, {O. K.} and Hupp, {J. T.} and Lohr, {T. L.} and M. Delferro and Marks, {T. J.}",

year = "2017",

doi = "10.1039/c6dt03952a",

language = "English",

volume = "46",

pages = "1172--1178",

journal = "Dalton Transactions",

issn = "1477-9226",

publisher = "Royal Society of Chemistry",

number = "4",

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TY - JOUR

T1 - Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

AU - Jurca, T.

AU - Peters, A. W.

AU - Mouat, A. R.

AU - Farha, O. K.

AU - Hupp, J. T.

AU - Lohr, T. L.

AU - Delferro, M.

AU - Marks, T. J.

PY - 2017

Y1 - 2017

N2 - The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

AB - The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

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DO - 10.1039/c6dt03952a

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