Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

T. Jurca; A. W. Peters; A. R. Mouat; O. K. Farha; Joseph T Hupp; T. L. Lohr; M. Delferro; Tobin J Marks

doi:10.1039/c6dt03952a

Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

T. Jurca, A. W. Peters, A. R. Mouat, O. K. Farha, Joseph T Hupp, T. L. Lohr, M. Delferro, Tobin J Marks

Northwestern University

Research output: Contribution to journal › Article

7 Citations (Scopus)

Abstract

The synthesis of molybdenum oxo-amidinate complexes MoO₂(R₂AMD)₂ [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and ⁱPr (3)], and their characterization by ¹H, ¹³C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO₃ film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O₃ as the second ALD reagent, yields nitride-free MoO₃ films.

Original language	English
Pages (from-to)	1172-1178
Number of pages	7
Journal	Dalton Transactions
Volume	46
Issue number	4
DOIs	https://doi.org/10.1039/c6dt03952a
Publication status	Published - 2017

ASJC Scopus subject areas

Inorganic Chemistry

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10.1039/c6dt03952a

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Jurca, T., Peters, A. W., Mouat, A. R., Farha, O. K., Hupp, J. T., Lohr, T. L., Delferro, M., & Marks, T. J. (2017). Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition. Dalton Transactions, 46(4), 1172-1178. https://doi.org/10.1039/c6dt03952a

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title = "Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition",

abstract = "The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.",

author = "T. Jurca and Peters, {A. W.} and Mouat, {A. R.} and Farha, {O. K.} and Hupp, {Joseph T} and Lohr, {T. L.} and M. Delferro and Marks, {Tobin J}",

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doi = "10.1039/c6dt03952a",

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T1 - Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

AU - Jurca, T.

AU - Peters, A. W.

AU - Mouat, A. R.

AU - Farha, O. K.

AU - Hupp, Joseph T

AU - Lohr, T. L.

AU - Delferro, M.

AU - Marks, Tobin J

PY - 2017

Y1 - 2017

N2 - The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

AB - The synthesis of molybdenum oxo-amidinate complexes MoO2(R2AMD)2 [AMD = N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) and iPr (3)], and their characterization by 1H, 13C NMR, X-ray diffraction, and thermogravimetric analysis is reported. Quartz-crystal microbalance and X-ray photoelectron spectroscopic studies confirm that 3 is an improved ALD precursor versus the R = t-butyl derivative for MoO3 film growth. Complex 3 is accessible in higher yields (80%+), is easier to handle without mass loss, and in conjunction with O3 as the second ALD reagent, yields nitride-free MoO3 films.

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