Secondary ion mass spectrometry of vapor-liquid-solid grown, Au-Catalyzed, Si Wires

Morgan C. Putnam, Michael A. Filler, Brendan M. Kayes, Michael D. Kelzenberg, Yunbin Guan, Nathan S. Lewis, John M. Eiler, Harry A. Atwater

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73 Citations (Scopus)

Abstract

Knowledge of the catalyst concentration within vapor-liquid-solid (VLS) grown semiconductor wires is needed in order to assess potential limits to electrical and optical device performance imposed by the VLS growth mechanism. We report herein the use of secondary ion mass spectrometry to characterize the Au catalyst concentration within individual, VLS-grown, Si wires. For Si wires grown by chemical vapor deposition from SiCU at 1000 °C, an upper limit on the bulk Au concentration was observed to be 1.7 x 10 16 atoms/cm 3, similar to the thermodynamic equilibrium concentration at the growth temperature. However, a higher concentration of Au was observed on the sidewalls of the wires

Original languageEnglish
Pages (from-to)3109-3113
Number of pages5
JournalNano letters
Volume8
Issue number10
DOIs
Publication statusPublished - Oct 1 2008

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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    Putnam, M. C., Filler, M. A., Kayes, B. M., Kelzenberg, M. D., Guan, Y., Lewis, N. S., Eiler, J. M., & Atwater, H. A. (2008). Secondary ion mass spectrometry of vapor-liquid-solid grown, Au-Catalyzed, Si Wires. Nano letters, 8(10), 3109-3113. https://doi.org/10.1021/nl801234y