Self patterning in supramolecular and templated materials

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The self patterning behavior of a system based on block molecules that aggregate into clusters with dimensions on the order of a few nanometers was reported. These materials self pattern on oxidized silicon surfaces into distinct structures with x-y maps which have been observed in other materials but with the characteristic feature of having a fixed height equal to that of the molecular cluster.

Original languageEnglish
Title of host publicationAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
PublisherAmerican Chemical Society
Pages397
Number of pages1
Volume40
Edition1
Publication statusPublished - Mar 1999
EventProceedings of the 1999 ACS Anaheim Meeting - Anaheim, CA, USA
Duration: Mar 21 1999Mar 25 1999

Other

OtherProceedings of the 1999 ACS Anaheim Meeting
CityAnaheim, CA, USA
Period3/21/993/25/99

ASJC Scopus subject areas

  • Polymers and Plastics

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