Abstract
The self patterning behavior of a system based on block molecules that aggregate into clusters with dimensions on the order of a few nanometers was reported. These materials self pattern on oxidized silicon surfaces into distinct structures with x-y maps which have been observed in other materials but with the characteristic feature of having a fixed height equal to that of the molecular cluster.
| Original language | English |
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| Title of host publication | American Chemical Society, Polymer Preprints, Division of Polymer Chemistry |
| Publisher | American Chemical Society |
| Pages | 397 |
| Number of pages | 1 |
| Volume | 40 |
| Edition | 1 |
| Publication status | Published - Mar 1999 |
| Event | Proceedings of the 1999 ACS Anaheim Meeting - Anaheim, CA, USA Duration: Mar 21 1999 → Mar 25 1999 |
Other
| Other | Proceedings of the 1999 ACS Anaheim Meeting |
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| City | Anaheim, CA, USA |
| Period | 3/21/99 → 3/25/99 |
ASJC Scopus subject areas
- Polymers and Plastics