Abstract
Patterning of nanostructures with sub-200 nm periodicities over cm2-scale areas is challenging using standard approaches. This paper demonstrates a scalable technique for feature-density doubling that can generate nanopatterned lines with periodicities down to 100 nm covering >3 cm2. We developed a process based on controlled wet overetching of atomic-layer deposited alumina to tune feature sizes of alumina masks down to several nm. These features transferred into silicon served as masters for template-stripping aluminum nanogratings with three different periodicities. The aluminum nanogratings supported surface plasmon polariton modes at ultraviolet wavelengths that, in agreement with calculations, depended on periodicity and incident excitation angle.
| Original language | English |
|---|---|
| Pages (from-to) | 33554-33558 |
| Number of pages | 5 |
| Journal | ACS Applied Materials and Interfaces |
| Volume | 9 |
| Issue number | 39 |
| DOIs | |
| Publication status | Published - Jan 1 2017 |
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Keywords
- Aluminum
- Lithography
- Nanopatterning
- Surface plasmon
- Template stripping
- Ultraviolet plasmonics
ASJC Scopus subject areas
- Materials Science(all)
Cite this
Sequential feature-density doubling for ultraviolet plasmonics. / Knudson, Michael P.; Hryn, Alexander J.; Huntington, Mark D.; Odom, Teri W.
In: ACS Applied Materials and Interfaces, Vol. 9, No. 39, 01.01.2017, p. 33554-33558.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Sequential feature-density doubling for ultraviolet plasmonics
AU - Knudson, Michael P.
AU - Hryn, Alexander J.
AU - Huntington, Mark D.
AU - Odom, Teri W
PY - 2017/1/1
Y1 - 2017/1/1
N2 - Patterning of nanostructures with sub-200 nm periodicities over cm2-scale areas is challenging using standard approaches. This paper demonstrates a scalable technique for feature-density doubling that can generate nanopatterned lines with periodicities down to 100 nm covering >3 cm2. We developed a process based on controlled wet overetching of atomic-layer deposited alumina to tune feature sizes of alumina masks down to several nm. These features transferred into silicon served as masters for template-stripping aluminum nanogratings with three different periodicities. The aluminum nanogratings supported surface plasmon polariton modes at ultraviolet wavelengths that, in agreement with calculations, depended on periodicity and incident excitation angle.
AB - Patterning of nanostructures with sub-200 nm periodicities over cm2-scale areas is challenging using standard approaches. This paper demonstrates a scalable technique for feature-density doubling that can generate nanopatterned lines with periodicities down to 100 nm covering >3 cm2. We developed a process based on controlled wet overetching of atomic-layer deposited alumina to tune feature sizes of alumina masks down to several nm. These features transferred into silicon served as masters for template-stripping aluminum nanogratings with three different periodicities. The aluminum nanogratings supported surface plasmon polariton modes at ultraviolet wavelengths that, in agreement with calculations, depended on periodicity and incident excitation angle.
KW - Aluminum
KW - Lithography
KW - Nanopatterning
KW - Surface plasmon
KW - Template stripping
KW - Ultraviolet plasmonics
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U2 - 10.1021/acsami.7b10842
DO - 10.1021/acsami.7b10842
M3 - Article
VL - 9
SP - 33554
EP - 33558
JO - ACS applied materials & interfaces
JF - ACS applied materials & interfaces
SN - 1944-8244
IS - 39
ER -