Sequential feature-density doubling for ultraviolet plasmonics

Michael P. Knudson, Alexander J. Hryn, Mark D. Huntington, Teri W Odom

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Patterning of nanostructures with sub-200 nm periodicities over cm2-scale areas is challenging using standard approaches. This paper demonstrates a scalable technique for feature-density doubling that can generate nanopatterned lines with periodicities down to 100 nm covering >3 cm2. We developed a process based on controlled wet overetching of atomic-layer deposited alumina to tune feature sizes of alumina masks down to several nm. These features transferred into silicon served as masters for template-stripping aluminum nanogratings with three different periodicities. The aluminum nanogratings supported surface plasmon polariton modes at ultraviolet wavelengths that, in agreement with calculations, depended on periodicity and incident excitation angle.

Original languageEnglish
Pages (from-to)33554-33558
Number of pages5
JournalACS Applied Materials and Interfaces
Volume9
Issue number39
DOIs
Publication statusPublished - Jan 1 2017

Fingerprint

Aluminum Oxide
Aluminum
Alumina
Silicon
Masks
Nanostructures
Wavelength

Keywords

  • Aluminum
  • Lithography
  • Nanopatterning
  • Surface plasmon
  • Template stripping
  • Ultraviolet plasmonics

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Sequential feature-density doubling for ultraviolet plasmonics. / Knudson, Michael P.; Hryn, Alexander J.; Huntington, Mark D.; Odom, Teri W.

In: ACS Applied Materials and Interfaces, Vol. 9, No. 39, 01.01.2017, p. 33554-33558.

Research output: Contribution to journalArticle

Knudson, Michael P. ; Hryn, Alexander J. ; Huntington, Mark D. ; Odom, Teri W. / Sequential feature-density doubling for ultraviolet plasmonics. In: ACS Applied Materials and Interfaces. 2017 ; Vol. 9, No. 39. pp. 33554-33558.
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