| Original language | English |
|---|---|
| Title of host publication | Mat Res Soc Symp Proc |
| Pages | 357-358 |
| Number of pages | 2 |
| Volume | 3 |
| Publication status | Published - 1981 |
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Semiconducting silicon
Silicides
Rutherford backscattering spectroscopy
Spectroscopy
ASJC Scopus subject areas
- Engineering(all)
Cite this
Cohen, R. L., Feldman, L. C., West, K. W., & Silverman, P. J. (1981). SILICIDE FORMATION AT Fe-Si INTERFACES STUDIED BY MOESSBAUER SPECTROSCOPY AND RUTHERFORD BACKSCATTERING. In Mat Res Soc Symp Proc (Vol. 3, pp. 357-358)
SILICIDE FORMATION AT Fe-Si INTERFACES STUDIED BY MOESSBAUER SPECTROSCOPY AND RUTHERFORD BACKSCATTERING. / Cohen, R. L.; Feldman, Leonard C; West, K. W.; Silverman, P. J.
Mat Res Soc Symp Proc. Vol. 3 1981. p. 357-358.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
Cohen, RL, Feldman, LC, West, KW & Silverman, PJ 1981, SILICIDE FORMATION AT Fe-Si INTERFACES STUDIED BY MOESSBAUER SPECTROSCOPY AND RUTHERFORD BACKSCATTERING. in Mat Res Soc Symp Proc. vol. 3, pp. 357-358.
Cohen RL, Feldman LC, West KW, Silverman PJ. SILICIDE FORMATION AT Fe-Si INTERFACES STUDIED BY MOESSBAUER SPECTROSCOPY AND RUTHERFORD BACKSCATTERING. In Mat Res Soc Symp Proc. Vol. 3. 1981. p. 357-358
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AU - Silverman, P. J.
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