Silicon effect on the hardness of r.f. Sputtered B-C

Si amorphous films

Cristina Louro, João C. Oliveira, Manish Chhowalla, Albano Cavaleiro

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

B-C and B-C:Si films were deposited by r.f. magnetron sputtering from a hot-pressed B4C polycrystalline target with Si pieces placed on the preferentially eroded zone. The effect of Si content, ranging from 2 to 6 at-%, on the B-C films was studied at a fixed substrate bias of -70 V. Preliminary depositions with different substrate bias showed that with -70 V the deposition of free carbon was avoided. All deposited films were X-ray diffraction (XRD) amorphous, and the result was confirmed by Fourier transform infrared spectroscopy (FTIR). Si-containing films were harder than Si-free ones, reaching 30 GPa for compositions up to 4.5 at.-% Si. After thermal annealing of the B-C:Si films up to 700 °C, an increase of the hardness was observed. The maximum hardness of 37 GPa was obtained for 2 at-% Si film annealed at 600 °C, which corresponds to an increase of -23% in relation to the as-deposited conditions. No vestiges of crystallinity were found either by XRD or FTIR analysis suggesting that the structure of the Si-containing films consisted of a local order arrangement of boron-rich icosahedral units

Original languageEnglish
JournalPlasma Processes and Polymers
Volume6
Issue numberSUPPL. 1
DOIs
Publication statusPublished - 2009

Fingerprint

Silicon
Amorphous films
hardness
Hardness
silicon
Fourier transform infrared spectroscopy
infrared spectroscopy
X ray diffraction
Boron
Substrates
Magnetron sputtering
diffraction
Carbon
crystallinity
magnetron sputtering
Annealing
boron
x rays
annealing
Chemical analysis

Keywords

  • Boron carbide
  • Hardness
  • Heat treatment
  • Sputtering

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

Cite this

Silicon effect on the hardness of r.f. Sputtered B-C : Si amorphous films. / Louro, Cristina; Oliveira, João C.; Chhowalla, Manish; Cavaleiro, Albano.

In: Plasma Processes and Polymers, Vol. 6, No. SUPPL. 1, 2009.

Research output: Contribution to journalArticle

Louro, Cristina ; Oliveira, João C. ; Chhowalla, Manish ; Cavaleiro, Albano. / Silicon effect on the hardness of r.f. Sputtered B-C : Si amorphous films. In: Plasma Processes and Polymers. 2009 ; Vol. 6, No. SUPPL. 1.
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